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Title:
Preparation and Characterization of Amorphous Layer on Aluminum Alloy Formed by Plasma Electrolytic Deposition (PED)
Author: Guan YJ(关永军) ; Xia Y(夏原)
Source: 材料热处理学报
Issued Date: 2004
Volume: 25, Issue:5II, Pages:1084-1087
Abstract: In this investigation, protective layers were formed on aluminum substrate by Plasma Electrolytic Deposition (PED) using sodium silicate solution. The relation between the thickness of the layer and process time were studied. XRD,SEM, EDS were used to study the layer's structure, composition and micrograph. The results show that the deposited layers are amorphous and contain mainly oxygen, silicon, and aluminum. The possible formation mechanism of amorphous [Al-Si-O] layer was proposed: During discharge periods, Al2O3 phase of the passive film and SiO32-near the substrate surface are sintered into xSiO2(1-x)Al2O3 and then transformed into amorphous [Al-Si-O] phase.
Keyword: plasma electrolytic deposition ; amorphous layer ; aluminum alloy
Language: 英语
Indexed Type: CSCD ; EI
ISSN: 1009-6264
Subject: 力学
CSCD ID: CSCD:1847490
Citation statistics:
Content Type: 期刊论文
URI: http://dspace.imech.ac.cn/handle/311007/15646
Appears in Collections:力学所知识产出(1956-2008)_期刊论文

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Recommended Citation:
Guan YJ,Xia Y. Preparation and Characterization of Amorphous Layer on Aluminum Alloy Formed by Plasma Electrolytic Deposition (PED)[J]. 材料热处理学报,2004-01-01,25(5II):1084-1087.
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