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Preparation and Characterization of Amorphous Layer on Aluminum Alloy Formed by Plasma Electrolytic Deposition (PED)
Guan YJ(关永军); Xia Y(夏原)
2004
发表期刊材料热处理学报
卷号25期号:5II页码:1084-1087
ISSN1009-6264
摘要In this investigation, protective layers were formed on aluminum substrate by Plasma Electrolytic Deposition (PED) using sodium silicate solution. The relation between the thickness of the layer and process time were studied. XRD,SEM, EDS were used to study the layer's structure, composition and micrograph. The results show that the deposited layers are amorphous and contain mainly oxygen, silicon, and aluminum. The possible formation mechanism of amorphous [Al-Si-O] layer was proposed: During discharge periods, Al2O3 phase of the passive film and SiO32-near the substrate surface are sintered into xSiO2(1-x)Al2O3 and then transformed into amorphous [Al-Si-O] phase.
关键词Plasma Electrolytic Deposition Amorphous Layer Aluminum Alloy
学科领域力学
收录类别CSCD ; EI
语种英语
CSCD记录号CSCD:1847490
引用统计
文献类型期刊论文
条目标识符http://dspace.imech.ac.cn/handle/311007/15646
专题力学所知识产出(1956-2008)
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Guan YJ,Xia Y. Preparation and Characterization of Amorphous Layer on Aluminum Alloy Formed by Plasma Electrolytic Deposition (PED)[J]. 材料热处理学报,2004,25(5II):1084-1087.
APA 关永军,&夏原.(2004).Preparation and Characterization of Amorphous Layer on Aluminum Alloy Formed by Plasma Electrolytic Deposition (PED).材料热处理学报,25(5II),1084-1087.
MLA 关永军,et al."Preparation and Characterization of Amorphous Layer on Aluminum Alloy Formed by Plasma Electrolytic Deposition (PED)".材料热处理学报 25.5II(2004):1084-1087.
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