IMECH-IR  > 力学所知识产出(1956-2008)
Two-dimensional simulation of an electron cyclotron resonance plasma source with self-consistent power deposition
Liu MH; Hu XW; Wu HM(吴汉明); Wu QC; Yu GY; Pan Y; Liu, MH (reprint author), Huazhong Univ Sci & Technol, Dept Elect Engn, Wuhan 430074, Hubei, Peoples R China.
Source PublicationSurface & Coatings Technology
2000
Volume131Issue:1-3Pages:29-33
ISSN0257-8972
AbstractUsing a refined two-dimensional hybrid-model with self-consistent microwave absorption, we have investigated the change of plasma parameters such as plasma density and ionization rate with the operating conditions. The dependence of the ion current density and ion energy and angle distribution function at the substrate surface vs. the radial position, pressure and microwave power were discussed. Results of our simulation can be compared qualitatively with many experimental measurements.
Subject Area力学
DOI10.1016/S0257-8972(00)00798-2
Indexed BySCI
Language英语
WOS IDWOS:000165548200006
WOS KeywordMODE TRANSITION ; LOW-PRESSURE ; DISCHARGES ; BEHAVIOR ; DENSITY
WOS Research AreaMaterials Science ; Physics
WOS SubjectMaterials Science, Coatings & Films ; Physics, Applied
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Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/15936
Collection力学所知识产出(1956-2008)
Corresponding AuthorLiu, MH (reprint author), Huazhong Univ Sci & Technol, Dept Elect Engn, Wuhan 430074, Hubei, Peoples R China.
Recommended Citation
GB/T 7714
Liu MH,Hu XW,Wu HM,et al. Two-dimensional simulation of an electron cyclotron resonance plasma source with self-consistent power deposition[J]. Surface & Coatings Technology,2000,131,1-3,:29-33.
APA Liu MH.,Hu XW.,吴汉明.,Wu QC.,Yu GY.,...&Liu, MH .(2000).Two-dimensional simulation of an electron cyclotron resonance plasma source with self-consistent power deposition.Surface & Coatings Technology,131(1-3),29-33.
MLA Liu MH,et al."Two-dimensional simulation of an electron cyclotron resonance plasma source with self-consistent power deposition".Surface & Coatings Technology 131.1-3(2000):29-33.
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