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Analysis of Dislocation-Induced Strain Field in an Idealized Wafer-Bonded Microstructure
Zhang Y(张吟); Zhang, Y (reprint author), Chinese Acad Sci, Inst Mech, State Key Lab Nonlinear Mech, LNM, Beijing 100080, Peoples R China.
发表期刊Journal of Physics D-Applied Physics
2007
卷号40期号:4页码:1118-1127
ISSN0022-3727
摘要The localized dislocation at the interface induces uneven strain distribution in two wafer-bonded layers. Because of the different elastic properties of two bonding layers and this uneven strain distribution, the bilayered microstructure deflects and deflection relaxes the strains. Depending on the microstructure dimensions, elastic properties and lattice parameters, the contribution of deflection to strain field can be very significant. The interface condition also plays an important role in relaxing strain. Two models capable of describing different interface conditions are used for the analysis and offer a more comprehensive study on the dislocation-induced strain field in a wafer-bonded bilayered microstructure. The combined effect of microstructure dimensions and interface condition on the strain is presented and compared.
学科领域力学
DOI10.1088/0022-3727/40/4/032
收录类别SCI
语种英语
WOS记录号WOS:000245274300033
WOS研究方向Physics
WOS类目Physics, Applied
引用统计
被引频次:2[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://dspace.imech.ac.cn/handle/311007/16972
专题力学所知识产出(1956-2008)
通讯作者Zhang, Y (reprint author), Chinese Acad Sci, Inst Mech, State Key Lab Nonlinear Mech, LNM, Beijing 100080, Peoples R China.
推荐引用方式
GB/T 7714
Zhang Y,Zhang, Y . Analysis of Dislocation-Induced Strain Field in an Idealized Wafer-Bonded Microstructure[J]. Journal of Physics D-Applied Physics,2007,40,4,:1118-1127.
APA 张吟,&Zhang, Y .(2007).Analysis of Dislocation-Induced Strain Field in an Idealized Wafer-Bonded Microstructure.Journal of Physics D-Applied Physics,40(4),1118-1127.
MLA 张吟,et al."Analysis of Dislocation-Induced Strain Field in an Idealized Wafer-Bonded Microstructure".Journal of Physics D-Applied Physics 40.4(2007):1118-1127.
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