Low Temperature Properties of PI/SiO_2 Nanocomposite Films

doi:10.1016/j.mseb.2005.08.086

IMECH-IR > 力学所知识产出(1956-2008)

	Low Temperature Properties of PI/SiO_2 Nanocomposite Films
	Wang ZD; Lu JJ; Li Y; Fu SY; Jiang SQ; Zhao X
发表期刊	Materials Science and Engineering B-Solid State Materials for Advanced Technology
	2005
卷号	123 期号:3 页码:216-221
ISSN	0921-5107
摘要	In this paper, the mechanical properties of PI/Si_O, nanocomposite hybrid films with different silica doping levels are experimentally studied at low temperature. Experimental results show that the coefficient of thermal expansion (CTE) of the PI/Si_O, nanocomposite hybrid films gradually reduces when the ambiance temperature is decreased. At the liquid nitrogen temperature (77 K), the CTE value is about five times less than that at room temperature (287 K). The measured CTEs of hybrid films greatly decrease when doped with inorganic silica, especially when the silica doping level is more than 1 wt.%. However, too high silica contents (more than 10 wt.%) can cause problem to disperse effectively and the specimens become quite opaque. Experimental results also show that the effects of the pre-applied stress levels can be neglected on the CTE testing. When the ambient temperature changes from 287 to 77 K, the measured average values of the films' ultimate tensile strength (UTS) and Young's modulus increase about 60 and 90%, respectively, while the breaking elongation decreases about 42%.
学科领域	力学
DOI	10.1016/j.mseb.2005.08.086
收录类别	SCI
语种	英语
WOS记录号	WOS:000232710500005
WOS研究方向	Science & Technology - Other Topics ; Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目	Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
引用统计	被引频次：21[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://dspace.imech.ac.cn/handle/311007/17556
专题	力学所知识产出(1956-2008)
推荐引用方式 GB/T 7714	Wang ZD,Lu JJ,Li Y,et al. Low Temperature Properties of PI/SiO_2 Nanocomposite Films[J]. Materials Science and Engineering B-Solid State Materials for Advanced Technology,2005,123,3,:216-221.
APA	Wang ZD,Lu JJ,Li Y,Fu SY,Jiang SQ,&Zhao X.(2005).Low Temperature Properties of PI/SiO_2 Nanocomposite Films.Materials Science and Engineering B-Solid State Materials for Advanced Technology,123(3),216-221.
MLA	Wang ZD,et al."Low Temperature Properties of PI/SiO_2 Nanocomposite Films".Materials Science and Engineering B-Solid State Materials for Advanced Technology 123.3(2005):216-221.

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