A Breakdown Criterion of Free Molecular Flows and an Optimum Analysis of EBPVD | |
Li SH(李帅辉); Fan J(樊菁); Shu YH(舒勇华); Li SH | |
会议录名称 | Rarefied Gas Dynamics |
2009 | |
页码 | 1105-1110 |
会议名称 | 26th International Symposium on Rarefied Gas Dynmaics (RGD26) |
会议日期 | JUN 20-JUL 25, 2008 |
会议地点 | Kyoto, JAPAN |
摘要 | Two important issues in electron beam physical vapor deposition (EBPVD) are addressed. The first issue is a validity condition of the classical cosine law widely used in the engineering context. This requires a breakdown criterion of the free molecular assumption on which the cosine law is established. Using the analytical solution of free molecular effusion flow, the number of collisions (N-c) for a particle moving from an evaporative source to a substrate is estimated that is proven inversely proportional to the local Knudsen number at the evaporation surface. N-c = 1 is adopted as a breakdown criterion of the free molecular assumption, and it is verified by experimental data and DSMC results. The second issue is how to realize the uniform distributions of thickness and component over a large-area thin film. Our analysis shows that at relatively low evaporation rates the goal is easy achieved through arranging the evaporative source positions properly and rotating the substrate. |
关键词 | Free Molecular Assumption Breakdown Criterion Optimization Thin Film Ebpvd Physical Vapor-deposition Yttrium |
WOS记录号 | WOS:000265564800177 |
收录类别 | CPCI-S |
语种 | 英语 |
引用统计 | |
文献类型 | 会议论文 |
条目标识符 | http://dspace.imech.ac.cn/handle/311007/25362 |
专题 | 高温气体动力学国家重点实验室 |
通讯作者 | Li SH |
推荐引用方式 GB/T 7714 | Li SH,Fan J,Shu YH,et al. A Breakdown Criterion of Free Molecular Flows and an Optimum Analysis of EBPVD[C]Rarefied Gas Dynamics,2009:1105-1110. |
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