The induction plasma chemical reactor: Part I. Equilibrium model

doi:10.1007/BF01460452

IMECH-IR > 力学所知识产出(1956-2008)

	The induction plasma chemical reactor: Part I. Equilibrium model
	Zhao GY; Mostaghimi J; Boulos MI
发表期刊	Plasma Chemistry and Plasma Processing
	1990
卷号	10 期号:1 页码:133-150
ISSN	0272-4324
摘要	A mathematical model is presented for the numerical simulation of the flow, temperature, and concentration fields in an rf plasma chemical reactor. The simulation is performed assuming chemical equilibrium. The extent of validity of this assumption is discussed. The system considered is the reaction of SiCl4 and NH3 for the production of Si3N4.
关键词	Induction Plasma - Modeling - Chemical Equilibrium - Silicon Nitride Synthesis
DOI	10.1007/BF01460452
收录类别	SCI
语种	英语
WOS记录号	WOS:A1990CT88500008
WOS研究方向	Engineering ; Physics
WOS类目	Engineering, Chemical ; Physics, Applied ; Physics, Fluids & Plasmas
引用统计	被引频次：30[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://dspace.imech.ac.cn/handle/311007/39594
专题	力学所知识产出(1956-2008)
推荐引用方式 GB/T 7714	Zhao GY,Mostaghimi J,Boulos MI. The induction plasma chemical reactor: Part I. Equilibrium model[J]. Plasma Chemistry and Plasma Processing,1990,10,1,:133-150.
APA	Zhao GY,Mostaghimi J,&Boulos MI.(1990).The induction plasma chemical reactor: Part I. Equilibrium model.Plasma Chemistry and Plasma Processing,10(1),133-150.
MLA	Zhao GY,et al."The induction plasma chemical reactor: Part I. Equilibrium model".Plasma Chemistry and Plasma Processing 10.1(1990):133-150.

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