IMECH-IR  > 力学所知识产出(1956-2008)
氢促进位错发射的分子动力学模拟
周国辉; 周富信; 赵雪丹; 张文清; 陈难先; 万发荣; 褚武扬
Source Publication中国科学. E辑, 技术科学
1998-02-15
Volume28Issue:1Pages:1
ISSN1006-9275
Abstract利用第一原理和陈氏三维晶格反演公式获得了Al和H的互作用对势。分子动力学计算表明,当Al晶体中含H时,裂尖发射位错的临界应力强度因子从0.11MPam~(1/2)降低为0.075MPam~(1/2)(C_H=0.72%)和0.06MPam~(1/2)(C_H=1.44%),即氢促进了位错的发射。计算表明,氢在裂尖富集后能形成许多小气团,同时使平衡空位浓度升高。
Keyword 位错发射 分子动力学 计算机模拟
Indexed ByCSCD
Language中文
CSCD IDCSCD:476400
Citation statistics
Cited Times:7[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/40954
Collection力学所知识产出(1956-2008)
Corresponding Author周国辉
Recommended Citation
GB/T 7714
周国辉,周富信,赵雪丹,等. 氢促进位错发射的分子动力学模拟[J]. 中国科学. E辑, 技术科学,1998,28,1,:1.
APA 周国辉.,周富信.,赵雪丹.,张文清.,陈难先.,...&褚武扬.(1998).氢促进位错发射的分子动力学模拟.中国科学. E辑, 技术科学,28(1),1.
MLA 周国辉,et al."氢促进位错发射的分子动力学模拟".中国科学. E辑, 技术科学 28.1(1998):1.
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