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电弧离子镀薄膜中的颗粒尺寸及其影响的扫描电镜观察
Alternative TitleSEM analysis of Particles and its effects in arc ion plating
李成明; 孙晓军; 张勇; 李桂英; 曹尔妍; 唐伟忠; 吕反修
Source Publication电子显微学报
2004-06-25
Volume23Issue:3Pages:252-256
ISSN1000-6281
Abstract用扫描电镜对比分析了电弧离子镀增加直线磁场过滤对沉积TiN和TiAlN薄膜中颗粒的密度和尺寸的影响,,结果表明,TIN薄膜中颗粒的最大直径,从14μm减小到3μm,颗粒密度从lO~9/cm~2。降低到10~5/cm~2.TilN薄膜由于靶材中含有低熔点金属Al,因而发射出更大的颗粒,有的颗粒集团达到20μm,磁场过滤后颗粒尺寸减小,颗粒密度降低到10~6/cm~2。分析了脉冲叠加直流偏压对TiCrZrN复合薄膜相组成的影响。颗粒可使电弧离子镀rriN/crN多层膜的结合力降低,并使针孔产生遗传。使用直线型磁场过滤及脉冲叠加直流偏压不仅使颗粒密度和尺寸显著降低和减小,而且多层化对小颗粒产生了包覆作用。
Keyword电弧离子镀
Indexed ByCSCD
Language中文
Funding Organization中国科学院兰州化学物理研究所固体润滑国家重点实验室资助项目(No 01 03).
CSCD IDCSCD:1632663
Citation statistics
Cited Times:4[CSCD]   [CSCD Record]
Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/41840
Collection力学所知识产出(1956-2008)
Corresponding Author李成明
Recommended Citation
GB/T 7714
李成明,孙晓军,张勇,等. 电弧离子镀薄膜中的颗粒尺寸及其影响的扫描电镜观察[J]. 电子显微学报,2004,23(3):252-256.
APA 李成明.,孙晓军.,张勇.,李桂英.,曹尔妍.,...&吕反修.(2004).电弧离子镀薄膜中的颗粒尺寸及其影响的扫描电镜观察.电子显微学报,23(3),252-256.
MLA 李成明,et al."电弧离子镀薄膜中的颗粒尺寸及其影响的扫描电镜观察".电子显微学报 23.3(2004):252-256.
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