IMECH-IR  > 力学所知识产出(1956-2008)
低能离子束方法制备磁性Fe-Si合金薄膜
刘力锋; 陈诺夫; 张富强; 陈晨龙; 李艳丽; 杨少延; 刘志凯
Source Publication功能材料
2004-08-25
Issue4Pages:429-431
Abstract 利用质量分离的低能离子束技术,获得了磁性Fe Si合金薄膜。利用俄歇电子能谱法(AES)、X射线衍射法(XRD)以及交变梯度样品磁强计(AGM)测试了样品的组分、结构以及磁特性。测试结果表明在室温下制备的Fe Si合金是Fe组分渐变的非晶薄膜,具有室温铁磁性。当衬底温度为300℃时制备的非晶Fe Si薄膜中有Fe硅化物FeSi相产生,样品的铁磁性被抑制。
Keyword低能离子束 铁磁性 磁性半导体
Language中文
Funding Organization国家自然科学基金资助项目(60176001) ; 国家重大基础研究计划资助项目(G20000365和G2002CB311905)
Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/42044
Collection力学所知识产出(1956-2008)
Corresponding Author刘力锋
Recommended Citation
GB/T 7714
刘力锋,陈诺夫,张富强,等. 低能离子束方法制备磁性Fe-Si合金薄膜[J]. 功能材料,2004(4):429-431.
APA 刘力锋.,陈诺夫.,张富强.,陈晨龙.,李艳丽.,...&刘志凯.(2004).低能离子束方法制备磁性Fe-Si合金薄膜.功能材料(4),429-431.
MLA 刘力锋,et al."低能离子束方法制备磁性Fe-Si合金薄膜".功能材料 .4(2004):429-431.
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