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真空磁过滤电弧离子镀法制备类金刚石涂层方法及性能研究
王秀兰; 刘文言; 刘洪源; 张泰华
Source Publication宇航材料工艺
2002-12-30
Volume32Issue:6Pages:52-54
ISSN1007-2330
Abstract采用真空磁过滤电弧离子镀方法,在GT35基体上沉积类金刚石膜。通过对清洗工艺及弧电流、工件所加负偏压、沉积温度等参数的研究,制定出了合理的工艺路线,并对这种膜层进行了X-射线光电子谱(XPS)分析,利用干涉仪、纳米硬度计对膜层的粗糙度、纳米硬度作了进一步检测。结果表明,采用此种方法制备的类金刚石膜层,SP^3含量约为40.1%;组织致密,无大的颗粒;镀膜后的粗糙度可以达到0.015μm;纳米硬度约为55GPa。并将膜层与TiN膜层组成摩擦副,进行了耐磨性试验。结果表明膜层的耐磨性较好。
Keyword真空磁过滤电弧离子镀 类金刚石 耐磨性 涂层 制备 薄膜
Indexed ByCSCD
Language中文
CSCD IDCSCD:1120545
Citation statistics
Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/42132
Collection力学所知识产出(1956-2008)
Corresponding Author王秀兰
Recommended Citation
GB/T 7714
王秀兰,刘文言,刘洪源,等. 真空磁过滤电弧离子镀法制备类金刚石涂层方法及性能研究[J]. 宇航材料工艺,2002,32(6):52-54.
APA 王秀兰,刘文言,刘洪源,&张泰华.(2002).真空磁过滤电弧离子镀法制备类金刚石涂层方法及性能研究.宇航材料工艺,32(6),52-54.
MLA 王秀兰,et al."真空磁过滤电弧离子镀法制备类金刚石涂层方法及性能研究".宇航材料工艺 32.6(2002):52-54.
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