IMECH-IR  > 力学所知识产出(1956-2008)
低能离子束方法制备Fe组分渐变的Fe-Si薄膜
刘力锋; 陈诺夫; 张富强; 陈晨龙; 李艳丽; 杨少延; 刘志凯
Source Publication稀有金属
2004-06-30
Volume28Issue:3Pages:558-562
Abstract利用质量分离的低能离子束技术 ,获得了Fe组分渐变的Fe Si薄膜。利用俄歇电子能谱法 (AES)、X射线衍射法 (XRD)以及X射线光电子能谱法 (XPS)测试了薄膜的组分、结构特性。测试结果表明 ,在室温下制备的Fe Si薄膜呈非晶态。非晶薄膜在 40 0℃下退火 2 0min后晶化 ,没有Fe的硅化物相形成。退火后Fe Si薄膜的Fe组分从表面向内部逐渐降低。
Keyword低能离子束 薄膜
Language中文
Funding Organization国家自然科学基金 ( 60 1760 0 1,60 3 90 0 72 )
Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/42156
Collection力学所知识产出(1956-2008)
Corresponding Author刘力锋
Recommended Citation
GB/T 7714
刘力锋,陈诺夫,张富强,等. 低能离子束方法制备Fe组分渐变的Fe-Si薄膜[J]. 稀有金属,2004,28(3):558-562.
APA 刘力锋.,陈诺夫.,张富强.,陈晨龙.,李艳丽.,...&刘志凯.(2004).低能离子束方法制备Fe组分渐变的Fe-Si薄膜.稀有金属,28(3),558-562.
MLA 刘力锋,et al."低能离子束方法制备Fe组分渐变的Fe-Si薄膜".稀有金属 28.3(2004):558-562.
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