Fast plasma sintering deposition of nano-structured silicon carbide coatings

IMECH-IR > 等离子体与燃烧中心(2009-2011)

	Fast plasma sintering deposition of nano-structured silicon carbide coatings
	Huang HJ(黄河激); Fu ZQ(付志强); Pan WX(潘文霞); Wu CK(吴承康); Huang HJ(黄河激)
会议录名称	18th International Vacuum Congress.北京.2010-08-23~2010-08-27.
	2011-01-06
会议名称	18th International Vacuum Congress
会议日期	2010-08-23~2010-08-27
会议地点	北京
摘要	Fast plasma sintering deposition of SiC nano-structured coatings was achieved using a specially designed non-transferred dc plasma torch operated at reduced pressure. Employing the Taguchi method, the deposition parameters were optimized and verified. With the optimized combination of deposition parameters, homogeneous SiC coatings were deposited on relatively large area substrates of Φ50 mm and 50×50 mm with a deposition rate as high as 20 μm/min. Ablation test showed that such coatings can be used as oxidation resistance coatings in high temperature oxidizing environment.
关键词	Reduced-pressure Plasma Sintering Deposition Silicon Carbide Coating Ultrafast Deposition
课题组名称	LHD应用等离子体力学(CPCR)
收录类别	CPCI
语种	英语
文献类型	会议论文
条目标识符	http://dspace.imech.ac.cn/handle/311007/43279
专题	等离子体与燃烧中心(2009-2011)
通讯作者	Huang HJ(黄河激)
推荐引用方式 GB/T 7714	Huang HJ,Fu ZQ,Pan WX,et al. Fast plasma sintering deposition of nano-structured silicon carbide coatings[C]18th International Vacuum Congress.北京.2010-08-23~2010-08-27.,2011.

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