IMECH-IR  > 等离子体与燃烧中心(2009-2011)
A fixed arc length direct current plasma torch for reduced pressure deposition of thin films
Huang HJ(黄河激); Pan WX(潘文霞); Fu ZQ(付志强); Wu CK(吴承康)
Source Publication10th Asia-Pacific Conference on Plasma Science and Technology.Jeju, Korea.2010-07-04~2010-07-08.
2011-01-12
Conference Name10th Asia-Pacific Conference on Plasma Science and Technology
Conference Date2010-07-04~2010-07-08
Conference PlaceJeju, Korea
AbstractBecause of its high energy density direct current(dc)thermal plasmas are widely accepted as a processing medium which facilitates high processing rates high fluxes of radical species the potential for smaller jnstallations a wide choice of reactants and high quench rates[1].A broad range of industrial processing methods have been developed based on dc plasma technology. However,nonstationary features limited new applications of dc plasma in advanced processing, where reliability£¬reproducibility and precise controllability are required£. These challenges call for better understanding of the arc and jet behavior over a wide range of generating parameters and a comprehensive control of every aspect of lhe plasma processing.
KeywordFixed-length Dc Plasma Reduced Pressure Deposition Thermal Plasma
DepartmentLHD应用等离子体力学(CPCR)
Indexed By其他
Language英语
Document Type会议论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/43291
Collection等离子体与燃烧中心(2009-2011)
Corresponding AuthorHuang HJ(黄河激)
Recommended Citation
GB/T 7714
Huang HJ,Pan WX,Fu ZQ,et al. A fixed arc length direct current plasma torch for reduced pressure deposition of thin films[C]10th Asia-Pacific Conference on Plasma Science and Technology.Jeju, Korea.2010-07-04~2010-07-08.,2011.
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