A fixed arc length direct current plasma torch for reduced pressure deposition of thin films

IMECH-IR > 等离子体与燃烧中心(2009-2011)

	A fixed arc length direct current plasma torch for reduced pressure deposition of thin films
	Huang HJ(黄河激); Pan WX(潘文霞); Fu ZQ(付志强); Wu CK(吴承康)
会议录名称	10th Asia-Pacific Conference on Plasma Science and Technology.Jeju, Korea.2010-07-04~2010-07-08.
	2011-01-12
会议名称	10th Asia-Pacific Conference on Plasma Science and Technology
会议日期	2010-07-04~2010-07-08
会议地点	Jeju, Korea
摘要	Because of its high energy density direct current(dc)thermal plasmas are widely accepted as a processing medium which facilitates high processing rates high fluxes of radical species the potential for smaller jnstallations a wide choice of reactants and high quench rates[1].A broad range of industrial processing methods have been developed based on dc plasma technology. However,nonstationary features limited new applications of dc plasma in advanced processing, where reliability£¬reproducibility and precise controllability are required£. These challenges call for better understanding of the arc and jet behavior over a wide range of generating parameters and a comprehensive control of every aspect of lhe plasma processing.
关键词	Fixed-length Dc Plasma Reduced Pressure Deposition Thermal Plasma
课题组名称	LHD应用等离子体力学(CPCR)
收录类别	其他
语种	英语
文献类型	会议论文
条目标识符	http://dspace.imech.ac.cn/handle/311007/43291
专题	等离子体与燃烧中心(2009-2011)
通讯作者	Huang HJ(黄河激)
推荐引用方式 GB/T 7714	Huang HJ,Pan WX,Fu ZQ,et al. A fixed arc length direct current plasma torch for reduced pressure deposition of thin films[C]10th Asia-Pacific Conference on Plasma Science and Technology.Jeju, Korea.2010-07-04~2010-07-08.,2011.

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