IMECH-IR  > 等离子体与燃烧中心(2009-2011)
等离子体活性烧结纳米碳化硅涂层的实验研究
黄河激; 付志强; 潘文霞; 吴承康
Source Publication第三届高超声速科技学术会议.无锡.2010-10-26~2010-10-28.
2011-01-12
Conference Name第三届高超声速科技学术会议
Conference Date2010-10-26~2010-10-28
Conference Place无锡
Abstract利用减压等离子体活性烧结制备了碳化硅涂层。研究了不同等离子体气流流量、真空室压力、电源功率、基板距离等工艺参数组合对涂层质量的影响规律。通过正交实验确定了优化工艺参数组合,在Φ50 mm以及50×50 mm的较大石墨基板上获得了厚度和成分均匀,结合良好的SiC涂层。沉积速率高达20 μm/min。利用小型电弧等离子体风洞对制备的涂层进行了烧蚀实验,结果表明所制备的涂层在有氧高温高速气流环境下无剥落,可有效保护基体石墨。
Keyword减压等离子体活性烧结 碳化硅涂层 高速沉积
DepartmentLHD应用等离子体力学(CPCR)
Indexed By其他
Language中文
Document Type会议论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/43296
Collection等离子体与燃烧中心(2009-2011)
Corresponding Author黄河激
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黄河激,付志强,潘文霞,等. 等离子体活性烧结纳米碳化硅涂层的实验研究[C]第三届高超声速科技学术会议.无锡.2010-10-26~2010-10-28.,2011.
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