IMECH-IR  > 高温气体动力学国家重点实验室
电子束蒸发制备YBCO超导薄膜研究
Alternative TitleStudy of YBCO films prepared by E-beam evaporation
王连红; 舒勇华; 樊菁
Source Publication低温与超导
2010-11-24
Volume38Issue:11Pages:21-24
ISSN1001-7100
Abstract采用电子束沉积制备YBCO超导薄膜,研究了760℃-840℃的不同退火温度下高温热处理对YBCO薄膜双轴织构,表面形貌及超导性能的影响.超导临界电流密度测试,X射线衍射(XRD)和扫描电镜(SEM)的结果表明,退火温度在在800℃时,YBCO薄膜具有良好的织构和平整致密的表面形貌,在77K自场下的临界电流密度J可达4.2×106/cm2
KeywordYbco 电子束沉积 超导薄膜
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Indexed ByCSCD
Language中文
CSCD IDCSCD:4064842
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Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/43902
Collection高温气体动力学国家重点实验室
Corresponding Author王连红
Recommended Citation
GB/T 7714
王连红,舒勇华,樊菁. 电子束蒸发制备YBCO超导薄膜研究[J]. 低温与超导,2010,38(11):21-24.
APA 王连红,舒勇华,&樊菁.(2010).电子束蒸发制备YBCO超导薄膜研究.低温与超导,38(11),21-24.
MLA 王连红,et al."电子束蒸发制备YBCO超导薄膜研究".低温与超导 38.11(2010):21-24.
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