IMECH-IR  > 先进制造工艺力学重点实验室
磁控溅射阴极靶磁场分布的定量评价
Alternative TitleQuantitative evaluation for magnetic field distribution of magnetron sputtering target
高方圆; 李光; 夏原
Source Publication材料热处理学报
2010
Volume31Issue:12Pages:153-157
ISSN1009-6264
Abstract针对磁控溅射阴极靶磁场分布难以进行定量评价的问题,提出以磁场水平分量Bx的平行率Rk为量化指标,对磁场分布状态进行评价的新方法;采用有限元方法,模拟分析了磁控溅射阴极靶结构参数对磁场分布的影响规律,并利用Rk对结构参数的合理性进行了验证.结果表明,量化指标Rk可以有效地评价磁场分布的优劣,能够为磁场模拟及分析提供基础的科学判据
Keyword磁控溅射 磁场分布 结构参数 平行率
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Indexed ByEI ; CSCD
Language中文
Funding Organization国家自然科学基金(10772179)
CSCD IDCSCD:4086205
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Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/44006
Collection先进制造工艺力学重点实验室
Corresponding Author高方圆
Recommended Citation
GB/T 7714
高方圆,李光,夏原. 磁控溅射阴极靶磁场分布的定量评价[J]. 材料热处理学报,2010,31(12):153-157.
APA 高方圆,李光,&夏原.(2010).磁控溅射阴极靶磁场分布的定量评价.材料热处理学报,31(12),153-157.
MLA 高方圆,et al."磁控溅射阴极靶磁场分布的定量评价".材料热处理学报 31.12(2010):153-157.
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