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Numerical simulation of ammonothermal growth processes of GaN crystals
Jiang YN(姜燕妮); Chen QS(陈启生); Prasad V; Chen, QS (reprint author), Chinese Acad Sci, Inst Mech, 15 Bei Si Huan Xi Rd, Beijing 100190, Peoples R China
会议录名称JOURNAL OF CRYSTAL GROWTH
2011
页码411-414
会议名称16th International Conference on Crystal Growth (ICCG16)/14th International Conference on Vapor Growth and Epitaxy (ICVGE14)
会议日期AUG 08-13, 2010
会议地点Beijing, PEOPLES R CHINA
摘要Gallium nitride (GaN) is a semiconductor material with a wide array of applications in the manufacture of blue/green light LEDs, lasers and high power electronic devices. In the ammonothermal growth, ammonia is used as a solvent instead of water as in the hydrothermal process. We modeled ammonothermal growth of GaN crystal of 1 in. size in a cylindrical high-pressure autoclave and discussed the effects of the different baffle design. We can conclude that, under the condition of forward solubility, the small opening is not in favor of the crystal growth. When the opening increases from 12% to 16%, the flow direction in the central hole changes from positive to negative. In the cases of 16% and 20% openings the flow in the autoclave exhibits a steady circulation, so the growth is stable. The transfer of raw material depends on the baffle opening and the temperature difference between growth zone and dissolving zone. (C) 2010 Elsevier B.V. All rights reserved.
关键词Convection Fluid Flow Growth Models Ammonothermal Growth Gan
课题组名称中科院国家微重力实验室
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收录类别CPCI(ISTP)
语种英语
文献类型会议论文
条目标识符http://dspace.imech.ac.cn/handle/311007/45323
专题微重力重点实验室
通讯作者Chen, QS (reprint author), Chinese Acad Sci, Inst Mech, 15 Bei Si Huan Xi Rd, Beijing 100190, Peoples R China
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Jiang YN,Chen QS,Prasad V,et al. Numerical simulation of ammonothermal growth processes of GaN crystals[C]JOURNAL OF CRYSTAL GROWTH,2011:411-414.
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