Effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 and stress control

doi:10.1007/s10409-012-0146-z

IMECH-IR > 微重力重点实验室

	Effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 and stress control
	Li YQ(李玉琼); Wang HQ; Wang WY; Yu ZN; Liu HS(刘河山); Jin G(靳刚); Jin, G
发表期刊	ACTA MECHANICA SINICA
	2012-10-01
卷号	28 期号:5 页码:1382-1388
ISSN	0567-7718
摘要	Based on Hartmann-Shack sensor technique, an online thin film stress measuring system was introduced to measure the film stresses of TiO2 and SiO2, and comparison was made between the film stresses prepared respectively by the conventional process and the ion-beam assisted deposition. The effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 was investigated in details, and the stress control methodologies using on-line adjustment and film doping were put forward. The results show that the film stress value of TiO2 prepared by ion-beam assisted deposition is 40 MPa lower than that prepared by conventional process, and the stress of TiO2 film changes gradually from tensile stress into compressive stress with increasing ion energy;while the film stress of SiO2 is a tensile stress under ion-beam assisted deposition because of the ion-beam sputtering effect, and the film refractive index decreases with increasing ion energy. A dynamic film stress control can be achieved through in-situ adjustment of the processing parameters based on the online film stress measuring technique, and the intrinsic stress of film can be effectively changed through film doping.
关键词	Film Stress Stress Controlling Ion-beam Assisted Deposition Hartmann-shack Sensor Thin-films Residual-stress
学科领域	制造工艺力学
DOI	10.1007/s10409-012-0146-z
URL	查看原文
收录类别	SCI ; EI ; CSCD
语种	英语
WOS记录号	WOS:000310884300018
关键词[WOS]	THIN-FILMS; RESIDUAL-STRESS
WOS类目	Engineering, Mechanical; Mechanics
课题组名称	NML纳米生物光学
论文分区	二类
引用统计	被引频次：1[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://dspace.imech.ac.cn/handle/311007/46583
专题	微重力重点实验室
通讯作者	Jin, G
推荐引用方式 GB/T 7714	Li YQ,Wang HQ,Wang WY,et al. Effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 and stress control[J]. ACTA MECHANICA SINICA,2012,28,5,:1382-1388.
APA	Li YQ.,Wang HQ.,Wang WY.,Yu ZN.,Liu HS.,...&Jin, G.(2012).Effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 and stress control.ACTA MECHANICA SINICA,28(5),1382-1388.
MLA	Li YQ,et al."Effect of ion-beam assisted deposition on the film stresses of TiO2 and SiO2 and stress control".ACTA MECHANICA SINICA 28.5(2012):1382-1388.

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