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Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation
Liu XM(刘小明); Liu ZL; Wei YG(魏悦广); Liu, XM; Chinese Acad Sci, Inst Mech, LNM, Beijing 100190, Peoples R China.
Source PublicationTRIBOLOGY LETTERS
2012-05-01
Volume46Issue:2Pages:167-178
ISSN1023-8883
AbstractThe friction behavior of the nanoscratching process is investigated using molecular dynamic simulations by considering a sphere indenter sliding against a nickel nanofilm structure. In the film/substrate system, the interface-dominated friction process is studied during the nanoscratch process. The results indicate that the interface accommodates deformation during the scratch by absorbing plastic deformation (such as stacking faults and partial dislocations) and by allowing locally interface slip. The observed local material shuffling beneath the tip that was strongly affected by the interface and friction mechanisms, including material ploughing along the track, filling in of the track, and piling up of the chip in front of the tip, are discussed. The combination effects of both scratching depths and film thicknesses were also investigated.
KeywordNanotribology Friction Reducing Friction Mechanisms Films Dynamic Modeling Molecular-dynamics Simulation Randomly Rough Surfaces Dislocation Nucleation Atomistic Simulation Contact Mechanics Film Thickness Thin-films Nanoindentation Deformation Multilayers
Subject Area新型材料的力学问题
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Indexed BySCI ; EI
Language英语
WOS IDWOS:000302251500008
Funding OrganizationThis work was supported by the National Natural Science Foundation of China ( Grants Nos. 10772096, 11021262, 10932011 and 91116003), and by the National Basic Research Program of China through 2012CB937500. The authors gratefully acknowledge useful discussions with Prof. F. P. Yuan from LNM at the Institute of Mechanics, Chinese Academy of Sciences.
DepartmentLNM新型材料及结构的多尺度力学
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Cited Times:17[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/46703
Collection非线性力学国家重点实验室
Corresponding AuthorLiu, XM; Chinese Acad Sci, Inst Mech, LNM, Beijing 100190, Peoples R China.
Recommended Citation
GB/T 7714
Liu XM,Liu ZL,Wei YG,et al. Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation[J]. TRIBOLOGY LETTERS,2012,46(2):167-178.
APA 刘小明,Liu ZL,魏悦广,Liu, XM,&Chinese Acad Sci, Inst Mech, LNM, Beijing 100190, Peoples R China..(2012).Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation.TRIBOLOGY LETTERS,46(2),167-178.
MLA 刘小明,et al."Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation".TRIBOLOGY LETTERS 46.2(2012):167-178.
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