IMECH-IR  > 非线性力学国家重点实验室
Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation
Liu XM(刘小明); Liu ZL; Wei YG(魏悦广); Liu, XM; Chinese Acad Sci, Inst Mech, LNM, Beijing 100190, Peoples R China.
发表期刊TRIBOLOGY LETTERS
2012-05-01
卷号46期号:2页码:167-178
ISSN1023-8883
摘要The friction behavior of the nanoscratching process is investigated using molecular dynamic simulations by considering a sphere indenter sliding against a nickel nanofilm structure. In the film/substrate system, the interface-dominated friction process is studied during the nanoscratch process. The results indicate that the interface accommodates deformation during the scratch by absorbing plastic deformation (such as stacking faults and partial dislocations) and by allowing locally interface slip. The observed local material shuffling beneath the tip that was strongly affected by the interface and friction mechanisms, including material ploughing along the track, filling in of the track, and piling up of the chip in front of the tip, are discussed. The combination effects of both scratching depths and film thicknesses were also investigated.
关键词Nanotribology Friction Reducing Friction Mechanisms Films Dynamic Modeling Molecular-dynamics Simulation Randomly Rough Surfaces Dislocation Nucleation Atomistic Simulation Contact Mechanics Film Thickness Thin-films Nanoindentation Deformation Multilayers
学科领域新型材料的力学问题
URL查看原文
收录类别SCI ; EI
语种英语
WOS记录号WOS:000302251500008
项目资助者This work was supported by the National Natural Science Foundation of China ( Grants Nos. 10772096, 11021262, 10932011 and 91116003), and by the National Basic Research Program of China through 2012CB937500. The authors gratefully acknowledge useful discussions with Prof. F. P. Yuan from LNM at the Institute of Mechanics, Chinese Academy of Sciences.
课题组名称LNM新型材料及结构的多尺度力学
引用统计
被引频次:24[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://dspace.imech.ac.cn/handle/311007/46703
专题非线性力学国家重点实验室
通讯作者Liu, XM; Chinese Acad Sci, Inst Mech, LNM, Beijing 100190, Peoples R China.
推荐引用方式
GB/T 7714
Liu XM,Liu ZL,Wei YG,et al. Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation[J]. TRIBOLOGY LETTERS,2012,46,2,:167-178.
APA 刘小明,Liu ZL,魏悦广,Liu, XM,&Chinese Acad Sci, Inst Mech, LNM, Beijing 100190, Peoples R China..(2012).Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation.TRIBOLOGY LETTERS,46(2),167-178.
MLA 刘小明,et al."Nanoscale friction behavior of the Ni-film/substrate system under scratching using MD simulation".TRIBOLOGY LETTERS 46.2(2012):167-178.
条目包含的文件 下载所有文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
SCI-J2012-133.pdf(1710KB) 开放获取--浏览 下载
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
Lanfanshu学术
Lanfanshu学术中相似的文章
[刘小明]的文章
[Liu ZL]的文章
[魏悦广]的文章
百度学术
百度学术中相似的文章
[刘小明]的文章
[Liu ZL]的文章
[魏悦广]的文章
必应学术
必应学术中相似的文章
[刘小明]的文章
[Liu ZL]的文章
[魏悦广]的文章
相关权益政策
暂无数据
收藏/分享
文件名: SCI-J2012-133.pdf
格式: Adobe PDF
此文件暂不支持浏览
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。