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Geometrical scaling law for laser shock processing
Wu XQ(吴先前); Tan QM(谈庆明); Huang CG(黄晨光); Huang, CG (reprint author), Chinese Acad Sci, Inst Mech, Key Lab Mech Fluid Solid Coupling Syst, Beijing 100190, Peoples R China.
AbstractScaling approach to laser shock processing is studied by dimensional analysis and numerical simulation. The essential dimensionless parameters controlling the shock effect are studied, and a geometrical scaling law correlating the input laser parameters and the output strengthening effect parameters is presented. The numerical results show that there is a competition controlling mechanism between thickness of confined overlay and laser duration for the surface residual stress; the plastically affected depth increases linearly with increasing laser duration, increases quadratically with increasing laser power density, and is almost independent with the thickness of confined overlay. Based on the results, a window of the optimal working parameters is presented.
KeywordPhysical Properties Controlling Mechanism Dimensional Analysis Dimensionless Parameters Geometrical Scaling Laser Power Density Laser Shock Processing Strengthening Effect Surface Residual Stress
Subject Area冲击动力学
Indexed BySCI ; EI
WOS IDWOS:000322539300005
Funding OrganizationNational Natural Science Foundation of China [10972228, 11002150]; Basic Research Equipment Project of Chinese Academy of Sciences [YZ200930]
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Cited Times:6[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Corresponding AuthorHuang, CG (reprint author), Chinese Acad Sci, Inst Mech, Key Lab Mech Fluid Solid Coupling Syst, Beijing 100190, Peoples R China.
Recommended Citation
GB/T 7714
Wu XQ,Tan QM,Huang CG,et al. Geometrical scaling law for laser shock processing[J]. JOURNAL OF APPLIED PHYSICS,2013,114(4):043105/1-043105/9.
APA 吴先前,谈庆明,黄晨光,&Huang, CG .(2013).Geometrical scaling law for laser shock processing.JOURNAL OF APPLIED PHYSICS,114(4),043105/1-043105/9.
MLA 吴先前,et al."Geometrical scaling law for laser shock processing".JOURNAL OF APPLIED PHYSICS 114.4(2013):043105/1-043105/9.
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