IMECH-IR  > 高温气体动力学国家重点实验室
预处理气氛对电子束蒸发制备YBCO薄膜性能和结构的影响
王连红; 舒勇华; 樊菁; 李保林
Source Publication第十二届全国物理力学学术会议论文摘要集
2012
Pages46-46
Conference Name第十二届全国物理力学学术会议
Conference Date2012-11-12
Conference Place中国广西桂林
Abstract本文采用电子束沉积制备YBCO超导薄膜,研究了不同预处理气氛对YBCO薄膜双轴织构、表面形貌及超导性能的影响。超导临界电流密度测试、X射线衍射(XRD)和扫描电镜(SEM)的结果表明,预处理气氛为Ar/O_2混合气体时,在退火温度为800℃时,YBCO薄膜具有良好的织构和平整致密的表面形貌,在77 K自场下的临界电流密度(J_c)可达4.2×10~6/cm~2。
KeywordYbco 电子束沉积 超导薄膜 预处理
DepartmentLHD微尺度和非平衡流动
Language中文
Document Type会议论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/48523
Collection高温气体动力学国家重点实验室
Recommended Citation
GB/T 7714
王连红,舒勇华,樊菁,等. 预处理气氛对电子束蒸发制备YBCO薄膜性能和结构的影响[C],2012:46-46.
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