| Oxidation resistance of Mo(Si1-xAlx)(2) nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy |
| Xu J; Li ZY(李正阳) ; Munroe P; Xie ZH; Xu, J (reprint author), Nanjing Univ Aeronaut & Astronaut, Dept Mat Sci & Engn, 29 Yudao St, Nanjing 210016, Jiangsu, Peoples R China.
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| 发表期刊 | RSC ADVANCES
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| 2014
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| 卷号 | 4期号:99页码:55696-55708 |
| ISSN | 2046-2069
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| 摘要 | To explore the influence of Al alloying on the oxidation resistance of MoSi2, four Mo(Si1-xAlx)(2) nanocrystalline films, with differing Al contents, were fabricated on Ti-6A1-4V substrates by a double-cathode glow discharge technique and their cyclic oxidation behavior was characterized at 500 degrees C in air. The oxidation kinetics of the four Mo((Si1-xAlx)(2) films was found to obey a subparabolic behavior with respect to the overall exposure, and their oxidation resistance was improved by Al additions. On the other hand, the electrochemical behavior of the oxide scales developed on the four Mo((Si1-xAlx)(2) nanocrystalline films in a 3.5 wt% NaCl solution was studied using electrochemical-impedance spectroscopy (EIS). The impedance data showed that with increasing oxidation time, the oxide scales transformed from a homogeneous and dense structure to a duplex structure consisting of a porous outer layer and a denser inner layer. The resistance of the oxide scales increased with increasing Al addition, implying an enhanced protective ability of the oxide scales by Al alloying in media containing chlorine ions. The findings represent a step forward in improving the surface integrity of alloy components used in the hot zones of jet engines. |
| 学科领域 | Chemistry
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| URL | 查看原文
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| 收录类别 | SCI
; EI
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| 语种 | 英语
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| WOS记录号 | WOS:000344997800004
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| 项目资助者 | The authors acknowledge the financial support of the National Natural Science Foundation of China under Grant no. 51175245 and no. 51374130 and the Aeronautics Science Foundation of China under Grant no. 2013ZE52058.
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| 课题组名称 | MAMYAG激光毛化技术
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| 论文分区 | 二类/Q2
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| 引用统计 |
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| 文献类型 | 期刊论文
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| 条目标识符 | http://dspace.imech.ac.cn/handle/311007/49451
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| 专题 | 先进制造工艺力学实验室
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| 通讯作者 | Xu, J (reprint author), Nanjing Univ Aeronaut & Astronaut, Dept Mat Sci & Engn, 29 Yudao St, Nanjing 210016, Jiangsu, Peoples R China. |
推荐引用方式
GB/T 7714 |
Xu J,Li ZY,Munroe P,et al. Oxidation resistance of Mo(Si1-xAlx)(2) nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy[J]. RSC ADVANCES,2014,4,99,:55696-55708.
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| APA |
Xu J,李正阳,Munroe P,Xie ZH,&Xu, J .(2014).Oxidation resistance of Mo(Si1-xAlx)(2) nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy.RSC ADVANCES,4(99),55696-55708.
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| MLA |
Xu J,et al."Oxidation resistance of Mo(Si1-xAlx)(2) nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy".RSC ADVANCES 4.99(2014):55696-55708.
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