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Oxidation resistance of Mo(Si1-xAlx)(2) nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy
Xu J; Li ZY(李正阳); Munroe P; Xie ZH; Xu, J (reprint author), Nanjing Univ Aeronaut & Astronaut, Dept Mat Sci & Engn, 29 Yudao St, Nanjing 210016, Jiangsu, Peoples R China.
Source PublicationRSC ADVANCES
2014
Volume4Issue:99Pages:55696-55708
ISSN2046-2069
AbstractTo explore the influence of Al alloying on the oxidation resistance of MoSi2, four Mo(Si1-xAlx)(2) nanocrystalline films, with differing Al contents, were fabricated on Ti-6A1-4V substrates by a double-cathode glow discharge technique and their cyclic oxidation behavior was characterized at 500 degrees C in air. The oxidation kinetics of the four Mo((Si1-xAlx)(2) films was found to obey a subparabolic behavior with respect to the overall exposure, and their oxidation resistance was improved by Al additions. On the other hand, the electrochemical behavior of the oxide scales developed on the four Mo((Si1-xAlx)(2) nanocrystalline films in a 3.5 wt% NaCl solution was studied using electrochemical-impedance spectroscopy (EIS). The impedance data showed that with increasing oxidation time, the oxide scales transformed from a homogeneous and dense structure to a duplex structure consisting of a porous outer layer and a denser inner layer. The resistance of the oxide scales increased with increasing Al addition, implying an enhanced protective ability of the oxide scales by Al alloying in media containing chlorine ions. The findings represent a step forward in improving the surface integrity of alloy components used in the hot zones of jet engines.
Subject AreaChemistry
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Indexed BySCI ; EI
Language英语
WOS IDWOS:000344997800004
Funding OrganizationThe authors acknowledge the financial support of the National Natural Science Foundation of China under Grant no. 51175245 and no. 51374130 and the Aeronautics Science Foundation of China under Grant no. 2013ZE52058.
DepartmentMAMYAG激光毛化技术
Classification二类/Q2
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Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/49452
Collection先进制造工艺力学重点实验室
Corresponding AuthorXu, J (reprint author), Nanjing Univ Aeronaut & Astronaut, Dept Mat Sci & Engn, 29 Yudao St, Nanjing 210016, Jiangsu, Peoples R China.
Recommended Citation
GB/T 7714
Xu J,Li ZY,Munroe P,et al. Oxidation resistance of Mo(Si1-xAlx)(2) nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy[J]. RSC ADVANCES,2014,4(99):55696-55708.
APA Xu J,李正阳,Munroe P,Xie ZH,&Xu, J .(2014).Oxidation resistance of Mo(Si1-xAlx)(2) nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy.RSC ADVANCES,4(99),55696-55708.
MLA Xu J,et al."Oxidation resistance of Mo(Si1-xAlx)(2) nanocrystalline films and characterization of their oxide scales by electrochemical impedance spectroscopy".RSC ADVANCES 4.99(2014):55696-55708.
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