Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings

doi:10.1016/j.phpro.2012.03.606

	Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings
	Huang HJ(黄河激); Fu ZQ(付志强); Pan WX(潘文霞); Wu CK(吴承康)
发表期刊	Physics Procedia
	2012
卷号	32 页码:598-604
ISSN	1875-3892
摘要	Fast plasma sintering deposition of SiC nano-structured coatings was achieved using a specially designed non-transferred dc plasma torch operated at reduced pressure. Employing the Taguchi method, the deposition parameters were optimized and verified. With the optimized combination of deposition parameters, homogeneous SiC coatings were deposited on relatively large area substrates of Φ50 mm and 50×50 mm with a deposition rate as high as 20 μm/min. Ablation test showed that such coatings can be used as oxidation resistance coatings in high temperature oxidizing environment.
关键词	Reduced-pressure Plasma Sintering Deposition Silicon Carbide Coating Ultrafast Deposition
DOI	10.1016/j.phpro.2012.03.606
收录类别	CPCI
语种	英语
WOS记录号	WOS:000310677500086
课题组名称	LHD应用等离子体力学(CPCR)
引用统计
文献类型	期刊论文
条目标识符	http://dspace.imech.ac.cn/handle/311007/58192
专题	高温气体动力学国家重点实验室
推荐引用方式 GB/T 7714	Huang HJ,Fu ZQ,Pan WX,et al. Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings[J]. Physics Procedia,2012,32:598-604.
APA	Huang HJ,Fu ZQ,Pan WX,&Wu CK.(2012).Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings.Physics Procedia,32,598-604.
MLA	Huang HJ,et al."Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings".Physics Procedia 32(2012):598-604.

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