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Enhancing the Scratch Resistance by Introducing Chemical Bonding in Highly Stretchable and Transparent Electrodes
Guo CF; Chen Y(陈艳); Tang L; Wang F; Ren ZF; Ren, ZF (reprint author), Univ Houston, Dept Phys, 3201 Cullen Blvd, Houston, TX 77204 USA.
Source PublicationNANO LETTERS
2016-01
Volume16Issue:1Pages:594-600
ISSN1530-6984
AbstractStretchable transparent electrodes are key elements in flexible electronics and e-skins. However, existing stretchable transparent electrodes, including graphene sheets, carbon nanotube, and metal nanowire networks, weakly adheres to the substrate by van der Waals forces. Such electrodes suffer from poor scratch-resistance or poor durability, and this issue has been one of the biggest problems for their applications in industry. Here we show that, by introducing a Au-S bond between a Au nanomesh (AuNM) and the underlying elastomeric substrate, the AuNM strongly adheres to the substrate and can withstand scratches of a pressure of several megapascals. We find that the strong chemical bond, on the other hand, leads to a stiffening effect and localized rupture of the AuNM upon stretching; thus the stretchability is poor. A prestraining process is applied to suppress the localized rupture and has successfully improved the stretchability: electrical resistance of the prestrained AuNM exhibits modest change by one-time stretching to 160%, or repeated stretching to 50% for 25 000 cycles. This conductor is an ideal platform for robust stretchable photoelectronics. The idea of introducing a covalent bond to improve the scratch-resistance may also be applied to other systems including Ag nanowire films, carbon nanotube films, graphene, and so forth.
KeywordScratch Resistance Au-s Bond Stretchability Localized Rupture Stretchable Transparent Electrodes
DOI10.1021/acs.nanolett.5b04290
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Indexed BySCI ; EI
Language英语
WOS IDWOS:000368322700091
WOS KeywordSELF-ASSEMBLED MONOLAYERS ; SILICON SURFACE ; NETWORK ; GOLD ; FILMS ; NANOWIRES ; DEVICES ; UNIFORM ; CELLS
WOS Research AreaChemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS SubjectChemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
Funding OrganizationFunding for this work was provided by the US Department of Energy under Contract Number DOE DE-SC0010831/DE-FG02-13ER46917 and National Natural Science Foundation of China under Grant No. 11202221 and 11572324.
DepartmentLNM冲击动力学与新型材料力学性能
Classification一类
RankingFalse
Citation statistics
Cited Times:22[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/58643
Collection非线性力学国家重点实验室
Corresponding AuthorRen, ZF (reprint author), Univ Houston, Dept Phys, 3201 Cullen Blvd, Houston, TX 77204 USA.
Recommended Citation
GB/T 7714
Guo CF,Chen Y,Tang L,et al. Enhancing the Scratch Resistance by Introducing Chemical Bonding in Highly Stretchable and Transparent Electrodes[J]. NANO LETTERS,2016,16(1):594-600.
APA Guo CF,陈艳,Tang L,Wang F,Ren ZF,&Ren, ZF .(2016).Enhancing the Scratch Resistance by Introducing Chemical Bonding in Highly Stretchable and Transparent Electrodes.NANO LETTERS,16(1),594-600.
MLA Guo CF,et al."Enhancing the Scratch Resistance by Introducing Chemical Bonding in Highly Stretchable and Transparent Electrodes".NANO LETTERS 16.1(2016):594-600.
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