IMECH-IR  > 高温气体动力学国家重点实验室
Effect of Growth Temperature on Composition Control for Vapor Deposition of YBa2Cu3O7-delta Precursor Films
Liu C(刘崇); Wang LH(王连红); Shu YH(舒勇华); Fan J(樊菁); Liu, C (reprint author), Chinese Acad Sci, Inst Mech, State Key Lab High Temp Gas Dynam, Beijing 100190, Peoples R China.
会议录名称PROCEEDINGS OF THE 29TH INTERNATIONAL SYMPOSIUM ON RAREFIED GAS DYNAMICS
2014
会议名称29th International Symposium on Rarefi ed Gas Dynamics (RGD)
会议日期JUL 13-18, 2014
会议地点Xian, PEOPLES R CHINA
摘要This work aims at exploiting the role of growth temperature on the dynamic behavior of deposition atoms as well as its resultant impact on the composition control during the synthesis of YBa2Cu3O7-delta precursor films by vapor codeposition. The codeposition of Yt, BaF2 and Cu is performed in vacuum chamber under a wide range of growth temperature from 25 degrees C, to 600 degrees C, the mass of each element deposited on LaAlO3 substrate and thus the film composition is examined by the inductively coupled plasma atomic emission spectroscopy. It is shown that the deposition amount of Cu decreases obviously with the increase of growth temperature; however, the mass of Yt and BaF2 deposited on the substrate appears to be insensitive to growth temperature. Moreover, high temperature may also trigger the influence of adsorbates composition on Cu desorption, and therefore the deposition amount of Cu decreases almost linearly as the mol fraction of BaF2 in the adlayers increases. Nevertheless, when the deposition is conducted at room temperature, the influence of mol fraction of BaF2 on Cu desorption vanishes. The detailed mechanisms associated with above phenomena are unveiled by molecular dynamics analysis, additionally the physical picture about adsorption behaviors on the growing interface under different deposition conditions is summarized, which is valuable for handling the composition control during the vapor codeposition of different functional films.
WOS记录号WOS:000346083400058
课题组名称LHD微尺度和非平衡流动
ISBN号978-0-7354-1265-1
URL查看原文
收录类别CPCI-S
语种英语
引用统计
被引频次:1[WOS]   [WOS记录]     [WOS相关记录]
文献类型会议论文
条目标识符http://dspace.imech.ac.cn/handle/311007/58865
专题高温气体动力学国家重点实验室
通讯作者Liu, C (reprint author), Chinese Acad Sci, Inst Mech, State Key Lab High Temp Gas Dynam, Beijing 100190, Peoples R China.
推荐引用方式
GB/T 7714
Liu C,Wang LH,Shu YH,et al. Effect of Growth Temperature on Composition Control for Vapor Deposition of YBa2Cu3O7-delta Precursor Films[C]PROCEEDINGS OF THE 29TH INTERNATIONAL SYMPOSIUM ON RAREFIED GAS DYNAMICS,2014.
条目包含的文件 下载所有文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
CPCI-Add014.pdf(690KB)会议论文 开放获取CC BY-NC-SA浏览 下载
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
Lanfanshu学术
Lanfanshu学术中相似的文章
[刘崇]的文章
[王连红]的文章
[舒勇华]的文章
百度学术
百度学术中相似的文章
[刘崇]的文章
[王连红]的文章
[舒勇华]的文章
必应学术
必应学术中相似的文章
[刘崇]的文章
[王连红]的文章
[舒勇华]的文章
相关权益政策
暂无数据
收藏/分享
文件名: CPCI-Add014.pdf
格式: Adobe PDF
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。