IMECH-IR  > 国家微重力实验室
基于胶体微球纳米透镜的无掩模光刻系统
蓝鼎; 吴奎; 魏同波; 王育人
2016-08-31
Rights Holder中国科学院力学研究所
Abstract本发明公开一种基于胶体微球纳米透镜的无掩模光刻系统,用以实现微纳米结构的转移。本系统基于现有光刻系统,利用胶体微球制备的纳米透镜对光束进行聚集,形成的聚焦阵列对光刻胶感光,可以实现间距为100nm-2000nm的点阵排列。此系统实现微纳米点阵结构,工艺简单,不需要添加额外的设备,克服了纳米球光刻工艺中,需要重复组装微纳米球所导致的产业化困难、工艺效率低下以及由此产生的质量不可控等缺点。本发明在图形转移上高度可控、图形高度精确有序、图形花样多样、操作简单、成本低廉,便于工业化生产,在制备纳米图形衬底、量子点、等离子体、网孔电极、光子晶体和微纳米器件等上有很好的应用前景。
Application Date2013-03-29
Date Available2016-08-31
Patent NumberZL201310106402.5
Language中文
Country中国
Document Type专利
Identifierhttp://dspace.imech.ac.cn/handle/311007/59501
Collection国家微重力实验室
Recommended Citation
GB/T 7714
蓝鼎,吴奎,魏同波,等. 基于胶体微球纳米透镜的无掩模光刻系统. ZL201310106402.5[P]. 2016-08-31.
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