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Dewetting-mediated pattern formation inside the coffee ring
Li WB(李伟斌); Lan D(蓝鼎); Wang YR(王育人); Lan, D (reprint author), Chinese Acad Sci, Inst Mech, Natl Micrograv Lab, Beijing 100190, Peoples R China.
Source PublicationPHYSICAL REVIEW E
AbstractThe rearrangement of particles in the final stage of droplet evaporation has been investigated by utilizing differential interference contrast microscopy and the formation mechanism of a network pattern inside a coffee ring has been revealed. A tailored substrate with a circular hydrophilic domain is prepared to obtain thin liquid film containing monolayer particles. Real-time bottom-view images show that the evolution of a dry patch could be divided into three stages: rupture initiation, dry patch expansion, and drying of the residual liquid. A growing number of dry patches will repeat these stages to form the network patterns inside the ringlike stain. It can be shown that the suction effect promotes the rupture of the liquid film and the formation of the dry patch. The particle-assembling process is totally controlled by the liquid film dewetting and dominated by the surface tension of the liquid film, which eventually determine the ultimate deposition patterns.
Indexed BySCI ; EI
WOS IDWOS:000399951900006
WOS SubjectPhysics, Fluids & Plasmas ; Physics, Mathematical
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Cited Times:5[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Corresponding AuthorLan, D (reprint author), Chinese Acad Sci, Inst Mech, Natl Micrograv Lab, Beijing 100190, Peoples R China.
Recommended Citation
GB/T 7714
Li WB,Lan D,Wang YR,et al. Dewetting-mediated pattern formation inside the coffee ring[J]. PHYSICAL REVIEW E,2017,95(4):042607.
APA 李伟斌,蓝鼎,王育人,&Lan, D .(2017).Dewetting-mediated pattern formation inside the coffee ring.PHYSICAL REVIEW E,95(4),042607.
MLA 李伟斌,et al."Dewetting-mediated pattern formation inside the coffee ring".PHYSICAL REVIEW E 95.4(2017):042607.
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