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Measuring Interlayer Shear Stress in Bilayer Graphene
Wang, Guorui; Dai, Zhaohe; Wang, Yanlei; Tan, PingHeng; Liu, Luqi; Xu, Zhiping; Wei YG(魏悦广); Huang, Rui; Zhang, Zhong; Liu, LQ; Zhang, Z (reprint author), Natl Ctr Nanosci & Technol, CAS Ctr Excellence Nanosci, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China.; Xu, ZP (reprint author), Tsinghua Univ, Dept Engn Mech, Appl Mech Lab, Beijing 100084, Peoples R China.; Xu, ZP (reprint author), Tsinghua Univ, Ctr Nano & Micro Mech, Beijing 100084, Peoples R China.
Source PublicationPHYSICAL REVIEW LETTERS
2017-07-17
Volume119Issue:3
ISSN0031-9007
Abstract

Monolayer two-dimensional (2D) crystals exhibit a host of intriguing properties, but the most exciting applications may come from stacking them into multilayer structures. Interlayer and interfacial shear interactions could play a crucial role in the performance and reliability of these applications, but little is known about the key parameters controlling shear deformation across the layers and interfaces between 2D materials. Herein, we report the first measurement of the interlayer shear stress of bilayer graphene based on pressurized microscale bubble loading devices. We demonstrate continuous growth of an interlayer shear zone outside the bubble edge and extract an interlayer shear stress of 40 kPa based on a membrane analysis for bilayer graphene bubbles. Meanwhile, a much higher interfacial shear stress of 1.64 MPa was determined for monolayer graphene on a silicon oxide substrate. Our results not only provide insights into the interfacial shear responses of the thinnest structures possible, but also establish an experimental method for characterizing the fundamental interlayer shear properties of the emerging 2D materials for potential applications in multilayer systems.

DOI10.1103/PhysRevLett.119.036101
Indexed BySCI ; EI
Language英语
WOS IDWOS:000405718000002
WOS KeywordRAMAN-SPECTROSCOPY ; MULTILAYER GRAPHENE ; MOLECULAR-DYNAMICS ; BIAXIAL STRAIN ; BLISTER TEST ; NANOCOMPOSITES ; ADHESION ; FILMS ; MECHANICS ; MEMBRANES
WOS Research AreaPhysics
WOS SubjectPhysics, Multidisciplinary
Funding OrganizationNational Key Basic Research Program of China(2013CB934203) ; National Key Research and Development Program of China(2016YFA0301204) ; National Natural Science Foundation of China(21474023 ; 11225210 ; 11434010 ; 11474277 ; 11225421)
Department其他
Classification一类
Ranking5+
Citation statistics
Cited Times:39[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/60910
Collection非线性力学国家重点实验室
Corresponding AuthorLiu, LQ; Zhang, Z (reprint author), Natl Ctr Nanosci & Technol, CAS Ctr Excellence Nanosci, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China.; Xu, ZP (reprint author), Tsinghua Univ, Dept Engn Mech, Appl Mech Lab, Beijing 100084, Peoples R China.; Xu, ZP (reprint author), Tsinghua Univ, Ctr Nano & Micro Mech, Beijing 100084, Peoples R China.
Recommended Citation
GB/T 7714
Wang, Guorui,Dai, Zhaohe,Wang, Yanlei,et al. Measuring Interlayer Shear Stress in Bilayer Graphene[J]. PHYSICAL REVIEW LETTERS,2017,119(3).
APA Wang, Guorui.,Dai, Zhaohe.,Wang, Yanlei.,Tan, PingHeng.,Liu, Luqi.,...&Xu, ZP .(2017).Measuring Interlayer Shear Stress in Bilayer Graphene.PHYSICAL REVIEW LETTERS,119(3).
MLA Wang, Guorui,et al."Measuring Interlayer Shear Stress in Bilayer Graphene".PHYSICAL REVIEW LETTERS 119.3(2017).
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