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Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films
Gao FY(高方圆); Li G(李光); Xia Y(夏原); Xia, Y (reprint author), Chinese Acad Sci, Inst Mech, 15 Beisihuanxi Rd, Beijing 100190, Peoples R China.
Source PublicationAPPLIED SURFACE SCIENCE
2018
Pages160-164
Conference Name5th Asian International Conference on Heat Treatment and Surface Engineering
Conference DateNOV 12-14, 2016
Conference PlaceHangzhou, PEOPLES R CHINA
Abstract

This article reports on the hysteresis effect in TiAlSiN films prepared by an intermediate frequency magnetron. The discharge voltages for different metallic alloy targets varying with nitrogen flow rate were systematically investigated, under a constant pressure provided by sputtering gas. The hysteresis transition was introduced by the sudden changes in sputtering rate, fraction of compound formation, phase composition and mechanical properties. The result was shown that: the initial growth rate aD in metallic mode was 4 times faster than that in supersaturated state. The optimized stoichiometric TiAl(Si)N-x=1 films containing 50 at.% N were founded in the transition region. The discussion on the plasma characteristics caused by hysteresis process showed that the TiN(111) texture could be increased by applying higher particle bombarding energy. The hardness of TiAlSiN film was strongly influenced by the orientation, which depended on the loading history of nitrogen. The superior TiAlSiN film with hardness 33 GPa could be prepared during the nitrogen unloading for same nitrogen flow rates. (C) 2017 Elsevier B.V. All rights reserved.

KeywordThin-films Mechanical-properties Coatings Microstructure Oxidation Evolution Al Si
WOS IDWOS:000416964200022
Funding OrganizationThis work is financially supported by the International Science & Technology Cooperation Program of China (No.2014DFG51240) and the Strategic Priority Research Program of the Chinese Academy of Sciences (No.XDB22040503).
Indexed ByCPCI-S
Language英语
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type会议论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/72161
Collection先进制造工艺力学重点实验室
Corresponding AuthorXia, Y (reprint author), Chinese Acad Sci, Inst Mech, 15 Beisihuanxi Rd, Beijing 100190, Peoples R China.
Affiliation1.[Gao, Fangyuan
2.Li, Guang
3.Xia, Yuan] Chinese Acad Sci, Inst Mech, 15 Beisihuanxi Rd, Beijing 100190, Peoples R China
4.[Gao, Fangyuan
5.Li, Guang
6.Xia, Yuan] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
Recommended Citation
GB/T 7714
Gao FY,Li G,Xia Y,et al. Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films[C]. AMSTERDAM:ELSEVIER SCIENCE BV,2018:160-164.
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