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Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films
Gao FY(高方圆); Li G(李光); Xia Y(夏原)
Source PublicationAPPLIED SURFACE SCIENCE
2018-02-15
Volume431Pages:160-164
ISSN0169-4332
AbstractThis article reports on the hysteresis effect in TiAlSiN films prepared by an intermediate frequency magnetron. The discharge voltages for different metallic alloy targets varying with nitrogen flow rate were systematically investigated, under a constant pressure provided by sputtering gas. The hysteresis transition was introduced by the sudden changes in sputtering rate, fraction of compound formation, phase composition and mechanical properties. The result was shown that: the initial growth rate aD in metallic mode was 4 times faster than that in supersaturated state. The optimized stoichiometric TiAl(Si)N-x=1 films containing 50 at.% N were founded in the transition region. The discussion on the plasma characteristics caused by hysteresis process showed that the TiN(111) texture could be increased by applying higher particle bombarding energy. The hardness of TiAlSiN film was strongly influenced by the orientation, which depended on the loading history of nitrogen. The superior TiAlSiN film with hardness 33 GPa could be prepared during the nitrogen unloading for same nitrogen flow rates. (C) 2017 Elsevier B.V. All rights reserved.
KeywordTialsin Films Reactive Sputtering Hysteresis Effect Plasma Characteristics Mechanical Properties
DOI10.1016/j.apsusc.2017.07.283
Indexed BySCI ; EI
Language英语
WOS IDWOS:000416964200022
WOS KeywordTHIN-FILMS ; MECHANICAL-PROPERTIES ; COATINGS ; MICROSTRUCTURE ; OXIDATION ; EVOLUTION ; AL ; SI
WOS Research AreaChemistry ; Materials Science ; Physics
WOS SubjectChemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
Funding OrganizationInternational Science & Technology Cooperation Program of China(2014DFG51240) ; Chinese Academy of Sciences(XDB22040503)
Classification一类
Ranking1
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Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/72227
Collection先进制造工艺力学重点实验室
Recommended Citation
GB/T 7714
Gao FY,Li G,Xia Y. Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films[J]. APPLIED SURFACE SCIENCE,2018,431:160-164.
APA 高方圆,李光,&夏原.(2018).Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films.APPLIED SURFACE SCIENCE,431,160-164.
MLA 高方圆,et al."Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films".APPLIED SURFACE SCIENCE 431(2018):160-164.
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