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Synthesis and characterization of super-hard AlCrTiVZr high-entropy alloy nitride films deposited by HiPIMS
Xu Y(许亿)1,2; Li G(李光)1,2; Xia Y(夏原)1,2
Source PublicationApplied Surface Science
2020-04
Volume523Issue:1Pages:146529
Abstract

Super-hard AlCrTiVZr high-entropy alloy (HEA) nitride films were synthesized by high power impulse magnetron sputtering (HiPIMS) without external heating. The effect of N2 gas low rate (FN), ranging from 0 sccm to 20 sccm, on the HiPIMS plasma discharge characterization, element concentration, deposition rate, microstructure, cross-sectional morphology, residual stress, and mechanical properties of films were explored. Results show that increasing FN increases the HiPIMS discharge current, accompanying with the decreased deposition rate. The saturated nitride (AlCrTiVZr)N films were obtained at FN = 8 sccm and higher, which exhibit a simple NaCl-type FCC structure. A continuous variation in the microstructure, from amorphous to columnar crystal structure, has been observed for these nitride films. It is discovered that the moderate FN of 0 sccm to 12 sccm leads to an enhanced bombardment with high-energy particles due to the increased plasma density, while the bombardment effect is weakened because of the decreased plasma energy as the FN is increased further. The nitride films deposited at FN = 12 sccm have super-hardness of 41.8 GPa and low wear rate of 2.3 × 10−7 mm3/Nm. Meanwhile, a change of preferred orientation from (2 0 0) to (1 1 1) is presented as the FN increases from 12 sccm to 20 sccm.

KeywordHigh entropy alloy (HEA) nitride filmsHigh power impulse magnetron sputtering (HiPIMS)Super-hardN2 gas flow rateMicrostructureMechanical properties
DOI10.1016/j.apsusc.2020.146529
Indexed BySCI ; EI
Language英语
Classification一类
Ranking1
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Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/81678
Collection先进制造工艺力学实验室
Corresponding AuthorLi G(李光); Xia Y(夏原)
Affiliation1.Institute of Mechanics, Chinese Academy of Sciences
2.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences
Recommended Citation
GB/T 7714
Xu Y,Li G,Xia Y. Synthesis and characterization of super-hard AlCrTiVZr high-entropy alloy nitride films deposited by HiPIMS[J]. Applied Surface Science,2020,523(1):146529.
APA Xu Y,Li G,&Xia Y.(2020).Synthesis and characterization of super-hard AlCrTiVZr high-entropy alloy nitride films deposited by HiPIMS.Applied Surface Science,523(1),146529.
MLA Xu Y,et al."Synthesis and characterization of super-hard AlCrTiVZr high-entropy alloy nitride films deposited by HiPIMS".Applied Surface Science 523.1(2020):146529.
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