IMECH-IR

Browse/Search Results:  1-4 of 4 Help

Filters            
Selected(0)Clear Items/Page:    Sort:
Whole-Process Modeling of Reservoir Turbidity Currents by a Double Layer-Averaged Model 期刊论文
Journal of Hydraulic Engineering, 2015, 卷号: 141, 期号: 2
Authors:  Cao ZX;  Li J;  Pender G;  Liu QQ(刘青泉);  Cao, ZX (reprint author), Wuhan Univ, State Key Lab Water Resources & Hydropower Engn S, Wuhan 430072, Peoples R China.
View  |  Adobe PDF(8598Kb)  |  Favorite  |  View/Download:456/58  |  Submit date:2015/03/17
Reservoir  Turbidity Current  Sedimentation  Sediment Flushing  Double Layer-averaged Model  Reservoir Management  
Effect of humidity on microstructure and properties of YBCO films prepared by Electron Beam Coevaporation 期刊论文
Science China-Technological Sciences, 2012, 卷号: 55, 期号: 8, 页码: 2291-2294
Authors:  Wang LH(王连红);  Shu YH(舒勇华);  Fan J(樊菁)
Adobe PDF(1090Kb)  |  Favorite  |  View/Download:860/287  |  Submit date:2012/12/04
Thin-films  Deposition  Ybco  Superconducting Films  Coevaporation  
Effects of anode temperature on the arc volt-ampere characteristics and ejected plume property of a low-power supersonic plasma 期刊论文
Plasma Sources Science & Technology, 2011, 卷号: 20, 期号: 6, 页码: 65006
Authors:  Pan WX(潘文霞);  Meng X(孟显);  Huang HJ(黄河激);  Wu CK(吴承康);  Pan, WX, Chinese Acad Sci, Inst Mech, Beijing 100190, Peoples R China
Adobe PDF(463Kb)  |  Favorite  |  View/Download:1183/247  |  Submit date:2012/03/31
Performance  Deposition  Nitrogen  Thruster  Surface  Argon  
Effects Of The Length Of A Cylindrical Solid Shield On The Entrainment Of Ambient Air Into Turbulent And Laminar Impinging Argon Plasma Jets 期刊论文
Plasma Chemistry And Plasma Processing, 2008, 页码: 85-105
Authors:  Wang HX(王海兴);  Chen X(陈熙);  Pan WX(潘文霞);  Chen, X (reprint author), Tsinghua Univ, Dept Engn Mech, Beijing 100084, Peoples R China.
Adobe PDF(1004Kb)  |  Favorite  |  View/Download:786/189  |  Submit date:2009/08/03
Impinging Plasma Jet  Air Entrainment  Solid-shield Effect  Materials Processing  Modeling  High-velocity  Gas Shroud  Deposition  Diffusion  Substrate  Flow