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Molecular dynamics simulation of deposition and growth of cu thin film on si substrate 会议论文
28th International Symposium on Rarefied Gas Dynamics (RGD), Zaragoza, SPAIN, JUL 09-13, 2012
作者:  Zhang J(张俊);  Liu C(刘崇);  Shu YH(舒勇华);  Fan J(樊菁);  Zhang, J (reprint author), Chinese Acad Sci, State Key Lab High Temp Gas Dynam, Inst Mech, Beijing 100190, Peoples R China.
Adobe PDF(668Kb)  |  收藏  |  浏览/下载：850/202  |  提交时间：2013/02/26
Thin Film Growth  Crystalline Structure And Orientation  Surface Roughness  Molecular Dynamics  Embedded-atom Method  Surfaces  Systems  Metals  
Growth and properties of Cu thin film deposited on Si(001) substrate: A molecular dynamics simulation study 期刊论文
Applied Surface Science, 2012, 卷号: 261, 期号: 15, 页码: 690-696
作者:  Zhang J(张俊);  Liu C(刘崇);  Shu YH(舒勇华);  Fan J(樊菁);  Fan, J (reprint author), Chinese Acad Sci, Inst Mech, State Key Lab High Temp Gas Dynam, Beijing 100190, Peoples R China.
Adobe PDF(1534Kb)  |  收藏  |  浏览/下载：1459/518  |  提交时间：2012/12/04
Embedded-atom Method  Epitaxial-growth  Si  Molecular Dynamics Method  Systems  Surface  Si(111)  Metals  Al  Thin Film Deposition And Growth  Crystalline Structure And Orientation  Surface Roughness  
A Breakdown Criterion of Free Molecular Flows and an Optimum Analysis of EBPVD 会议论文
26th International Symposium on Rarefied Gas Dynmaics (RGD26), Kyoto, JAPAN, JUN 20-JUL 25, 2008
作者:  Li SH(李帅辉);  Fan J(樊菁);  Shu YH(舒勇华);  Li SH
Adobe PDF(690Kb)  |  收藏  |  浏览/下载：987/146  |  提交时间：2009/07/23
Free Molecular Assumption  Breakdown Criterion  Optimization  Thin Film  Ebpvd  Physical Vapor-deposition  Yttrium  
Thickness And Component Distributions Of Yttrium-Titanium Alloy Films In Electron-Beam Physical Vapor Deposition 期刊论文
Science In China Series E-Technological Sciences, 2008, 页码: 1470-1482
作者:  Li SH(李帅辉);  Shu YH(舒勇华);  Fan J(樊菁);  Fan, J (reprint author), Chinese Acad Sci, Inst Mech, Lab High Temp Gas Dynam, Beijing 100190, Peoples R China.
Adobe PDF(485Kb)  |  收藏  |  浏览/下载：891/250  |  提交时间：2009/08/03
Electron Beam Physical Vapor Deposition  Thin Film  Thickness And Species Distributions  Vapor Atom  Nonequilibrium Transport  Monte-carlo-simulation  Sphere Model  Evaporation  
Thickness and component distributions of yttrium-titanium alloy films in multi-electron-beam physical vapor deposition 会议论文
the 8th Vacuum Metallurgy and Surface Engineering, Shenyang, PEOPLES R CHINA, JUN 16-19, 2007
作者:  Li SH(李帅辉);  Shu YH(舒勇华);  Fan J(樊菁)
浏览  |  Adobe PDF(756Kb)  |  收藏  |  浏览/下载：226/57  |  提交时间：2016/06/28
Electron Beam Physical Vapor Deposition  Thin Film  Thickness And Species Distributions  Vapor Atom  Non-equilibrium Transport Keywords Plus:Monte-carlo-simulation  Sphere Model  Evaporation