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Title:
Effects of superimposed pulse bias on TiN coating in cathodic arc deposition
Author: Li ZY(李正阳); Zhu WB(朱武飚); Zhang Y(张勇); Li GY(李桂英); Cao EY(曹尔妍)
Source: Surface & Coatings Technology
Issued Date: 2000
Volume: 131, Issue:1-3, Pages:158-161
Abstract: Orthogonal designs are used to investigate the main factors when doing experiments in which pulse bias is superimposed on d.c. bias during cathodic are deposition of TiN. Pulse peak, duty cycle, frequency, direct voltage, are current and pressure all are investigated when coating TiN on HSS substrates. Roughness, surface micrograph, microhardness and thickness are tested. By analysis of variance, it is shown that pressure and frequency are the main factors. R-a and droplet density of the film with (d.c. + pulse) bias decrease. A simple explanation for the result is suggested.
Language: 英语
Indexed Type: SCI
Corresponding Author: Li, ZY (reprint author), Chinese Acad Sci, Inst Mech, Beijing 100080, Peoples R China.
WOS Subject: Materials Science, Coatings & Films ; Physics, Applied
WOS Subject Extended: Materials Science ; Physics
WOS ID: WOS:000165548200032
ISSN: 0257-8972
Subject: 力学
Citation statistics:
Content Type: 期刊论文
URI: http://dspace.imech.ac.cn/handle/311007/16804
Appears in Collections:力学所知识产出(1956-2008)_期刊论文

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Recommended Citation:
Li ZY,Zhu WB,Zhang Y,et al. Effects of superimposed pulse bias on TiN coating in cathodic arc deposition[J]. Surface & Coatings Technology,2000-01-01,131(1-3):158-161.
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文件名: Effects of superimposed pulse bias on TiN coating in.pdf
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文件名: Corrigendum to‘Effects of superimposed pulse bias on TiN.pdf
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