Knowledge Management System of Institue of Mechanics, CAS
The induction plasma chemical reactor: Part II. Kinetic model | |
Zhao GY; Mostaghimi J; Boulos MI | |
发表期刊 | Plasma Chemistry and Plasma Processing |
1990 | |
卷号 | 10期号:1页码:151-166 |
ISSN | 0272-4324 |
摘要 | A kinetic model has been developed for the prediction of the concentration gelds in an rf plasma reactor. A sample calculation for a SiCl4/H2 system is then performed. The model considers the mixing processes along with the kinetics of seven reactions involving the decomposition of these reactants. The results obtained are compared to those assuming chemical equilibrium. The predictions indicate that an equilibrium assumption will result in lower predicted temperature fields in the reactor. Furthermore, for the chemical system considered here, while differences exist between the concentration fields obtained by the two models, the differences are not substantial. |
关键词 | Induction Plasma - Modeling - Chemical Kinetics - Dissociation Of Silicon Tetrachloride |
DOI | 10.1007/BF01460453 |
收录类别 | SCI |
语种 | 英语 |
WOS记录号 | WOS:A1990CT88500009 |
WOS研究方向 | Engineering ; Physics |
WOS类目 | Engineering, Chemical ; Physics, Applied ; Physics, Fluids & Plasmas |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://dspace.imech.ac.cn/handle/311007/39596 |
专题 | 力学所知识产出(1956-2008) |
推荐引用方式 GB/T 7714 | Zhao GY,Mostaghimi J,Boulos MI. The induction plasma chemical reactor: Part II. Kinetic model[J]. Plasma Chemistry and Plasma Processing,1990,10,1,:151-166. |
APA | Zhao GY,Mostaghimi J,&Boulos MI.(1990).The induction plasma chemical reactor: Part II. Kinetic model.Plasma Chemistry and Plasma Processing,10(1),151-166. |
MLA | Zhao GY,et al."The induction plasma chemical reactor: Part II. Kinetic model".Plasma Chemistry and Plasma Processing 10.1(1990):151-166. |
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