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Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films
Gao FY(高方圆); Li G(李光); Xia Y(夏原); Xia, Y (reprint author), Chinese Acad Sci, Inst Mech, 15 Beisihuanxi Rd, Beijing 100190, Peoples R China.
2018
会议名称5th Asian International Conference on Heat Treatment and Surface Engineering
会议日期NOV 12-14, 2016
会议地点Hangzhou, PEOPLES R CHINA
会议录名称APPLIED SURFACE SCIENCE
摘要This article reports on the hysteresis effect in TiAlSiN films prepared by an intermediate frequency magnetron. The discharge voltages for different metallic alloy targets varying with nitrogen flow rate were systematically investigated, under a constant pressure provided by sputtering gas. The hysteresis transition was introduced by the sudden changes in sputtering rate, fraction of compound formation, phase composition and mechanical properties. The result was shown that: the initial growth rate aD in metallic mode was 4 times faster than that in supersaturated state. The optimized stoichiometric TiAl(Si)N-x=1 films containing 50 at.% N were founded in the transition region. The discussion on the plasma characteristics caused by hysteresis process showed that the TiN(111) texture could be increased by applying higher particle bombarding energy. The hardness of TiAlSiN film was strongly influenced by the orientation, which depended on the loading history of nitrogen. The superior TiAlSiN film with hardness 33 GPa could be prepared during the nitrogen unloading for same nitrogen flow rates. (C) 2017 Elsevier B.V. All rights reserved.
关键词Thin-films Mechanical-properties Coatings Microstructure Oxidation Evolution Al Si
资助信息This work is financially supported by the International Science & Technology Cooperation Program of China (No.2014DFG51240) and the Strategic Priority Research Program of the Chinese Academy of Sciences (No.XDB22040503).
收录类别CPCI-S ; EI
语种英语
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文献类型会议论文
条目标识符http://dspace.imech.ac.cn/handle/311007/72161
专题先进制造工艺力学重点实验室
通讯作者Xia, Y (reprint author), Chinese Acad Sci, Inst Mech, 15 Beisihuanxi Rd, Beijing 100190, Peoples R China.
作者单位1.[Gao, Fangyuan
2.Li, Guang
3.Xia, Yuan] Chinese Acad Sci, Inst Mech, 15 Beisihuanxi Rd, Beijing 100190, Peoples R China
4.[Gao, Fangyuan
5.Li, Guang
6.Xia, Yuan] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
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Gao FY,Li G,Xia Y,et al. Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films[C]. AMSTERDAM:ELSEVIER SCIENCE BV,2018.
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