Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering | |
Li G(李光)1,2; Xu Y(许亿)1,2; Xia Y(夏原)1,2 | |
通讯作者 | Xia, Yuan(xia@imech.ac.cn) |
发表期刊 | coatings |
2020-06 | |
卷号 | 10期号:7页码:68 |
ISSN | 2079-6412 |
摘要 | A pulsed-dc (direct current) magnetron sputtering with a plasma emission monitor (PEM) system was applied to synthesize Cr-containing hydrogenated amorphous diamond-like carbon (Cr-DLC) films using a large-size industrial Cr target. The plasma emission intensity of a Cr atom at 358 nm wavelength was characterized by optical emission spectrometer (OES). C2H2 gas flow rate was precisely adjusted to obtain a stable plasma emission intensity. The relationships between Cr atom plasma emission intensity and the element concentration, cross-sectional morphology, deposition rate, microstructure, mechanical properties, and tribological properties of Cr-DLC films were investigated. Scanning electron microscope and Raman spectra were employed to analyze the chemical composition and microstructure, respectively. The mechanical and tribological behaviors were characterized and analyzed by using the nano-indentation, scratch test instrument, and ball-on-disk reciprocating friction/wear tester. The results indicate that the PEM system was successfully used in magnetron sputtering for a more stable Cr-DLC deposition process. |
关键词 | diamond-like carbon (DLC) plasma emission intensity magnetron sputtering tribological performance |
DOI | 10.3390/coatings10070608 |
收录类别 | SCI ; EI |
语种 | 英语 |
WOS记录号 | WOS:000554759500001 |
关键词[WOS] | MECHANICAL-PROPERTIES ; TRIBOLOGICAL PROPERTIES ; CARBON ; MICROSTRUCTURE ; TEMPERATURE ; HIPIMS ; AL |
WOS研究方向 | Materials Science |
WOS类目 | Materials Science, Coatings & Films |
资助项目 | National Nature Foundation of China[51871230] ; National Nature Foundation of China[51701229] ; Strategic Priority Research Program of the Chinese Academy of Sciences[XDB22040503] |
项目资助者 | National Nature Foundation of China ; Strategic Priority Research Program of the Chinese Academy of Sciences |
论文分区 | 二类 |
力学所作者排名 | 1 |
RpAuthor | xia y |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://dspace.imech.ac.cn/handle/311007/82087 |
专题 | 先进制造工艺力学实验室 |
作者单位 | 1.Institute of Mechanics, Chinese Academy of Sciences 2.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences |
推荐引用方式 GB/T 7714 | Li G,Xu Y,Xia Y. Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering[J]. coatings,2020,10,7,:68. |
APA | Li G,Xu Y,&Xia Y.(2020).Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering.coatings,10(7),68. |
MLA | Li G,et al."Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering".coatings 10.7(2020):68. |
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