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Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering
Li G(李光)1,2; Xu Y(许亿)1,2; Xia Y(夏原)1,2
Source Publicationcoatings
2020-06
Volume10Pages:68
ISSN2079-6412
Abstract

A pulsed-dc (direct current) magnetron sputtering with a plasma emission monitor (PEM) system was applied to synthesize Cr-containing hydrogenated amorphous diamond-like carbon (Cr-DLC) films using a large-size industrial Cr target. The plasma emission intensity of a Cr atom at 358 nm wavelength was characterized by optical emission spectrometer (OES). C2H2 gas flow rate was precisely adjusted to obtain a stable plasma emission intensity. The relationships between Cr atom plasma emission intensity and the element concentration, cross-sectional morphology, deposition rate, microstructure, mechanical properties, and tribological properties of Cr-DLC films were investigated. Scanning electron microscope and Raman spectra were employed to analyze the chemical composition and microstructure, respectively. The mechanical and tribological behaviors were characterized and analyzed by using the nano-indentation, scratch test instrument, and ball-on-disk reciprocating friction/wear tester. The results indicate that the PEM system was successfully used in magnetron sputtering for a more stable Cr-DLC deposition process.

Keyword: diamond-like carbon (DLC) plasma emission intensity magnetron sputtering tribological performance
DOI10.3390/coatings10070608
Indexed BySCI
Language英语
Classification二类
Ranking1
Citation statistics
Document Type期刊论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/82087
Collection先进制造工艺力学实验室
Affiliation1.Institute of Mechanics, Chinese Academy of Sciences
2.Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences
Recommended Citation
GB/T 7714
Li G,Xu Y,Xia Y. Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering[J]. coatings,2020,10:68.
APA Li G,Xu Y,&Xia Y.(2020).Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering.coatings,10,68.
MLA Li G,et al."Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering".coatings 10(2020):68.
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