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(Ti,Al)N Film On Normalized T8 Carbon Tool Steel Prepared By Pulsed High Energy Density Plasma Technique 期刊论文
Chinese Physics Letters, 2007, 页码: 3469-3472
Authors:  Liu YF;  Deng FP;  Han JM;  Xu XY;  Yang SZ;  Liu XB(刘秀波);  Liu, YF (reprint author), Beijing Jiatong Univ, Inst Mat Sci & Engn, Beijing 100044, Peoples R China.
Adobe PDF(1308Kb)  |  Favorite  |  View/Download：1111/244  |  Submit date：2009/08/03
Chemical-vapor-deposition  Ticl4/alcl3/n-2/h-2/ar Gas-mixture  (Ti1-xalx)n Coatings  Nitride Films  Behavior  
FexSi grown with mass-analyzed low-energy dual ion beam deposition 期刊论文
Journal of Crystal Growth, 2004, 卷号: 263, 期号: 1-4, 页码: 143-147
Authors:  Liu LF;  Chen NF(陈诺夫);  Zhang FQ(张富强);  Chen CL;  Li YL;  Yang SY;  Liu Z;  Liu, LF (reprint author), Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China.
Adobe PDF(224Kb)  |  Favorite  |  View/Download：619/143  |  Submit date：2009/08/03
Auger Electron Spectroscopy  X-ray Diffraction  Ion Beam depositIon  Semiconducting Silicon  Doped Si-mn  Spin-photonics  Thin-films  Silicon  Gas