Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings | |
Huang HJ(黄河激); Fu ZQ(付志强); Pan WX(潘文霞); Wu CK(吴承康) | |
发表期刊 | Physics Procedia |
2012 | |
卷号 | 32页码:598-604 |
ISSN | 1875-3892 |
摘要 | Fast plasma sintering deposition of SiC nano-structured coatings was achieved using a specially designed non-transferred dc plasma torch operated at reduced pressure. Employing the Taguchi method, the deposition parameters were optimized and verified. With the optimized combination of deposition parameters, homogeneous SiC coatings were deposited on relatively large area substrates of Φ50 mm and 50×50 mm with a deposition rate as high as 20 μm/min. Ablation test showed that such coatings can be used as oxidation resistance coatings in high temperature oxidizing environment. |
关键词 | Reduced-pressure Plasma Sintering Deposition Silicon Carbide Coating Ultrafast Deposition |
DOI | 10.1016/j.phpro.2012.03.606 |
收录类别 | CPCI |
语种 | 英语 |
WOS记录号 | WOS:000310677500086 |
课题组名称 | LHD应用等离子体力学(CPCR) |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://dspace.imech.ac.cn/handle/311007/58192 |
专题 | 高温气体动力学国家重点实验室 |
推荐引用方式 GB/T 7714 | Huang HJ,Fu ZQ,Pan WX,et al. Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings[J]. Physics Procedia,2012,32:598-604. |
APA | Huang HJ,Fu ZQ,Pan WX,&Wu CK.(2012).Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings.Physics Procedia,32,598-604. |
MLA | Huang HJ,et al."Fast Plasma Sintering Deposition of Nano-structured Silicon Carbide Coatings".Physics Procedia 32(2012):598-604. |
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