IMECH-IR  > 高温气体动力学国家重点实验室
Effect of Growth Temperature on Composition Control for Vapor Deposition of YBa2Cu3O7-delta Precursor Films
Liu C(刘崇); Wang LH(王连红); Shu YH(舒勇华); Fan J(樊菁); Liu, C (reprint author), Chinese Acad Sci, Inst Mech, State Key Lab High Temp Gas Dynam, Beijing 100190, Peoples R China.
Source PublicationPROCEEDINGS OF THE 29TH INTERNATIONAL SYMPOSIUM ON RAREFIED GAS DYNAMICS
2014
Conference Name29th International Symposium on Rarefi ed Gas Dynamics (RGD)
Conference DateJUL 13-18, 2014
Conference PlaceXian, PEOPLES R CHINA
AbstractThis work aims at exploiting the role of growth temperature on the dynamic behavior of deposition atoms as well as its resultant impact on the composition control during the synthesis of YBa2Cu3O7-delta precursor films by vapor codeposition. The codeposition of Yt, BaF2 and Cu is performed in vacuum chamber under a wide range of growth temperature from 25 degrees C, to 600 degrees C, the mass of each element deposited on LaAlO3 substrate and thus the film composition is examined by the inductively coupled plasma atomic emission spectroscopy. It is shown that the deposition amount of Cu decreases obviously with the increase of growth temperature; however, the mass of Yt and BaF2 deposited on the substrate appears to be insensitive to growth temperature. Moreover, high temperature may also trigger the influence of adsorbates composition on Cu desorption, and therefore the deposition amount of Cu decreases almost linearly as the mol fraction of BaF2 in the adlayers increases. Nevertheless, when the deposition is conducted at room temperature, the influence of mol fraction of BaF2 on Cu desorption vanishes. The detailed mechanisms associated with above phenomena are unveiled by molecular dynamics analysis, additionally the physical picture about adsorption behaviors on the growing interface under different deposition conditions is summarized, which is valuable for handling the composition control during the vapor codeposition of different functional films.
WOS IDWOS:000346083400058
DepartmentLHD微尺度和非平衡流动
ISBN978-0-7354-1265-1
URL查看原文
Indexed ByCPCI-S
Language英语
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Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type会议论文
Identifierhttp://dspace.imech.ac.cn/handle/311007/58865
Collection高温气体动力学国家重点实验室
Corresponding AuthorLiu, C (reprint author), Chinese Acad Sci, Inst Mech, State Key Lab High Temp Gas Dynam, Beijing 100190, Peoples R China.
Recommended Citation
GB/T 7714
Liu C,Wang LH,Shu YH,et al. Effect of Growth Temperature on Composition Control for Vapor Deposition of YBa2Cu3O7-delta Precursor Films[C]PROCEEDINGS OF THE 29TH INTERNATIONAL SYMPOSIUM ON RAREFIED GAS DYNAMICS,2014.
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