Measuring Interlayer Shear Stress in Bilayer Graphene | |
Wang, Guorui; Dai, Zhaohe; Wang, Yanlei; Tan, PingHeng; Liu, Luqi; Xu, Zhiping; Wei YG(魏悦广); Huang, Rui; Zhang, Zhong; Liu, LQ; Zhang, Z (reprint author), Natl Ctr Nanosci & Technol, CAS Ctr Excellence Nanosci, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China.; Xu, ZP (reprint author), Tsinghua Univ, Dept Engn Mech, Appl Mech Lab, Beijing 100084, Peoples R China.; Xu, ZP (reprint author), Tsinghua Univ, Ctr Nano & Micro Mech, Beijing 100084, Peoples R China. | |
发表期刊 | PHYSICAL REVIEW LETTERS |
2017-07-17 | |
卷号 | 119期号:3 |
ISSN | 0031-9007 |
摘要 | Monolayer two-dimensional (2D) crystals exhibit a host of intriguing properties, but the most exciting applications may come from stacking them into multilayer structures. Interlayer and interfacial shear interactions could play a crucial role in the performance and reliability of these applications, but little is known about the key parameters controlling shear deformation across the layers and interfaces between 2D materials. Herein, we report the first measurement of the interlayer shear stress of bilayer graphene based on pressurized microscale bubble loading devices. We demonstrate continuous growth of an interlayer shear zone outside the bubble edge and extract an interlayer shear stress of 40 kPa based on a membrane analysis for bilayer graphene bubbles. Meanwhile, a much higher interfacial shear stress of 1.64 MPa was determined for monolayer graphene on a silicon oxide substrate. Our results not only provide insights into the interfacial shear responses of the thinnest structures possible, but also establish an experimental method for characterizing the fundamental interlayer shear properties of the emerging 2D materials for potential applications in multilayer systems. |
DOI | 10.1103/PhysRevLett.119.036101 |
收录类别 | SCI ; EI |
语种 | 英语 |
WOS记录号 | WOS:000405718000002 |
关键词[WOS] | RAMAN-SPECTROSCOPY ; MULTILAYER GRAPHENE ; MOLECULAR-DYNAMICS ; BIAXIAL STRAIN ; BLISTER TEST ; NANOCOMPOSITES ; ADHESION ; FILMS ; MECHANICS ; MEMBRANES |
WOS研究方向 | Physics |
WOS类目 | Physics, Multidisciplinary |
项目资助者 | National Key Basic Research Program of China(2013CB934203) ; National Key Research and Development Program of China(2016YFA0301204) ; National Natural Science Foundation of China(21474023 ; 11225210 ; 11434010 ; 11474277 ; 11225421) |
课题组名称 | 其他 |
论文分区 | 一类 |
力学所作者排名 | 5+ |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://dspace.imech.ac.cn/handle/311007/60910 |
专题 | 非线性力学国家重点实验室 |
通讯作者 | Liu, LQ; Zhang, Z (reprint author), Natl Ctr Nanosci & Technol, CAS Ctr Excellence Nanosci, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China.; Xu, ZP (reprint author), Tsinghua Univ, Dept Engn Mech, Appl Mech Lab, Beijing 100084, Peoples R China.; Xu, ZP (reprint author), Tsinghua Univ, Ctr Nano & Micro Mech, Beijing 100084, Peoples R China. |
推荐引用方式 GB/T 7714 | Wang, Guorui,Dai, Zhaohe,Wang, Yanlei,et al. Measuring Interlayer Shear Stress in Bilayer Graphene[J]. PHYSICAL REVIEW LETTERS,2017,119,3,. |
APA | Wang, Guorui.,Dai, Zhaohe.,Wang, Yanlei.,Tan, PingHeng.,Liu, Luqi.,...&Xu, ZP .(2017).Measuring Interlayer Shear Stress in Bilayer Graphene.PHYSICAL REVIEW LETTERS,119(3). |
MLA | Wang, Guorui,et al."Measuring Interlayer Shear Stress in Bilayer Graphene".PHYSICAL REVIEW LETTERS 119.3(2017). |
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