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Title:
Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films
Author: Gao FY(高方圆); Li G(李光); Xia Y(夏原)
Source: APPLIED SURFACE SCIENCE
Issued Date: 2018-02-15
Volume: 431, Pages:160-164
Abstract: This article reports on the hysteresis effect in TiAlSiN films prepared by an intermediate frequency magnetron. The discharge voltages for different metallic alloy targets varying with nitrogen flow rate were systematically investigated, under a constant pressure provided by sputtering gas. The hysteresis transition was introduced by the sudden changes in sputtering rate, fraction of compound formation, phase composition and mechanical properties. The result was shown that: the initial growth rate aD in metallic mode was 4 times faster than that in supersaturated state. The optimized stoichiometric TiAl(Si)N-x=1 films containing 50 at.% N were founded in the transition region. The discussion on the plasma characteristics caused by hysteresis process showed that the TiN(111) texture could be increased by applying higher particle bombarding energy. The hardness of TiAlSiN film was strongly influenced by the orientation, which depended on the loading history of nitrogen. The superior TiAlSiN film with hardness 33 GPa could be prepared during the nitrogen unloading for same nitrogen flow rates. (C) 2017 Elsevier B.V. All rights reserved.
Keyword: TiAlSiN films ; Reactive sputtering ; Hysteresis effect ; Plasma characteristics ; Mechanical properties
Language: 英语
Indexed Type: SCI ; EI
DOI: 10.1016/j.apsusc.2017.07.283
DOC Type: Article
WOS Subject: Chemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
WOS Subject Extended: Chemistry ; Materials Science ; Physics
WOS Keyword Plus: THIN-FILMS ; MECHANICAL-PROPERTIES ; COATINGS ; MICROSTRUCTURE ; OXIDATION ; EVOLUTION ; AL ; SI
WOS ID: WOS:000416964200022
ISSN: 0169-4332
Funder: International Science & Technology Cooperation Program of China(2014DFG51240) ; Chinese Academy of Sciences(XDB22040503)
Classification: 一类
Ranking: 1
Citation statistics:
Content Type: 期刊论文
URI: http://dspace.imech.ac.cn/handle/311007/72227
Appears in Collections:先进制造工艺力学重点实验室_期刊论文

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Recommended Citation:
Gao FY,Li G,Xia Y. Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films[J]. APPLIED SURFACE SCIENCE,2018-02-15,431:160-164.
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