Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films | |
Gao FY(高方圆); Li G(李光); Xia Y(夏原) | |
发表期刊 | APPLIED SURFACE SCIENCE |
2018-02-15 | |
卷号 | 431页码:160-164 |
ISSN | 0169-4332 |
摘要 | This article reports on the hysteresis effect in TiAlSiN films prepared by an intermediate frequency magnetron. The discharge voltages for different metallic alloy targets varying with nitrogen flow rate were systematically investigated, under a constant pressure provided by sputtering gas. The hysteresis transition was introduced by the sudden changes in sputtering rate, fraction of compound formation, phase composition and mechanical properties. The result was shown that: the initial growth rate aD in metallic mode was 4 times faster than that in supersaturated state. The optimized stoichiometric TiAl(Si)N-x=1 films containing 50 at.% N were founded in the transition region. The discussion on the plasma characteristics caused by hysteresis process showed that the TiN(111) texture could be increased by applying higher particle bombarding energy. The hardness of TiAlSiN film was strongly influenced by the orientation, which depended on the loading history of nitrogen. The superior TiAlSiN film with hardness 33 GPa could be prepared during the nitrogen unloading for same nitrogen flow rates. (C) 2017 Elsevier B.V. All rights reserved. |
关键词 | Tialsin Films Reactive Sputtering Hysteresis Effect Plasma Characteristics Mechanical Properties |
DOI | 10.1016/j.apsusc.2017.07.283 |
收录类别 | SCI ; EI |
语种 | 英语 |
WOS记录号 | WOS:000416964200022 |
关键词[WOS] | THIN-FILMS ; MECHANICAL-PROPERTIES ; COATINGS ; MICROSTRUCTURE ; OXIDATION ; EVOLUTION ; AL ; SI |
WOS研究方向 | Chemistry ; Materials Science ; Physics |
WOS类目 | Chemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter |
项目资助者 | International Science & Technology Cooperation Program of China(2014DFG51240) ; Chinese Academy of Sciences(XDB22040503) |
论文分区 | 一类 |
力学所作者排名 | 1 |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://dspace.imech.ac.cn/handle/311007/72227 |
专题 | 先进制造工艺力学实验室 |
通讯作者 | Xia Y(夏原) |
推荐引用方式 GB/T 7714 | Gao FY,Li G,Xia Y. Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films[J]. APPLIED SURFACE SCIENCE,2018,431:160-164. |
APA | Gao FY,Li G,&Xia Y.(2018).Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films.APPLIED SURFACE SCIENCE,431,160-164. |
MLA | Gao FY,et al."Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films".APPLIED SURFACE SCIENCE 431(2018):160-164. |
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