Nanocracking and metallization doubly defined large-scale 3D plasmonic sub-10 nm-gap arrays as extremely sensitive SERS substrates

doi:10.1039/c7nr08646f

IMECH-IR > 非线性力学国家重点实验室

	Nanocracking and metallization doubly defined large-scale 3D plasmonic sub-10 nm-gap arrays as extremely sensitive SERS substrates
	Pan RH ; Yang Y ; Wang YJ ; Li S(李爽); Liu Z ; Su YW(苏业旺); Quan BG ; Li YL ; Gu CZ ; Li JJ
发表期刊	NANOSCALE
	2018-02-21
卷号	10 期号:7 页码:3171-3180
ISSN	2040-3364
摘要	Considering the technological difficulties in the existing approaches to form nanoscale gaps, a convenient method to fabricate three-dimensional (3D) sub-10 nm Ag/SiNx gap arrays has been demonstrated in this study, controlled by a combination of stress-induced nanocracking of a SiNx nanobridge and Ag nanofilm deposition. This scalable 3D plasmonic nanogap is specially suspended above a substrate, having a tunable nanogap width and large height-to-width ratio to form a nanocavity underneath. As a surface-enhanced Raman scattering (SERS) substrate, the 3D Ag/SiNx nanogap shows a large Raman enhancement factor of similar to 10(8) and extremely high sensitivity for the detection of Rhodamine 6G (R6G) molecules, even down to 10(-16) M, indicating an extraordinary capability for single-molecule detection. Further, we verified that the Fabry-Perot resonance occurred in the deep SiNx nanocavity under the Ag nanogap and contributed prominently to a tremendous enhancement of the local field in the Agnanogap zone and hence ultrasensitive SERS detection. This method circumvents the technological limitations to fabricate a sub-10 nm metal nanogap with unique features for wide applications in important scientific and technological areas.
DOI	10.1039/c7nr08646f
URL	查看原文
收录类别	SCI ; EI
语种	英语
WOS记录号	WOS:000425348100009
关键词[WOS]	SURFACE-ENHANCED RAMAN ; MOLECULAR JUNCTIONS ; LARGE-AREA ; SPECTROSCOPY ; SCATTERING ; FABRICATION ; MICROORGANISMS ; LITHOGRAPHY ; NANOANTENNA ; NANOGAPS
WOS研究方向	Chemistry, Multidisciplinary ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied
WOS类目	Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
项目资助者	Ministry of Science and Technology of China [2016YFA0200800, 2016YFA0200400, 2016YFB0100500] ; National Natural Science Foundation of China [11674387, 91323304, 11704401, 61390503, 11574385, 11574368] ; Strategic Priority Research Program of CAS [XDB07020200] ; Key Research Program of Frontier Sciences, CAS [QYZDJ-SSW-SLH042]
论文分区	一类
力学所作者排名	4
引用统计	被引频次：39[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://dspace.imech.ac.cn/handle/311007/77803
专题	非线性力学国家重点实验室
作者单位	1.Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China 2.Univ Chinese Acad Sci, Sch Phys Sci, CAS Key Lab Vacuum Phys, Beijing 100049, Peoples R China 3.Chinese Acad Sci, Inst Mech, State Key Lab Nonlinear Mech, Beijing 100190, Peoples R China 4.Collaborat Innovat Ctr Quantum Matter, Beijing, Peoples R China
推荐引用方式 GB/T 7714	Pan RH,Yang Y,Wang YJ,et al. Nanocracking and metallization doubly defined large-scale 3D plasmonic sub-10 nm-gap arrays as extremely sensitive SERS substrates[J]. NANOSCALE,2018,10,7,:3171-3180.
APA	Pan RH.,Yang Y.,Wang YJ.,李爽.,Liu Z.,...&Li JJ.(2018).Nanocracking and metallization doubly defined large-scale 3D plasmonic sub-10 nm-gap arrays as extremely sensitive SERS substrates.NANOSCALE,10(7),3171-3180.
MLA	Pan RH,et al."Nanocracking and metallization doubly defined large-scale 3D plasmonic sub-10 nm-gap arrays as extremely sensitive SERS substrates".NANOSCALE 10.7(2018):3171-3180.

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