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Mechanical Behavior of Nanometer Ni by Simulating Nanoindentation 期刊论文
Chinese Physics Letters, 2010, 卷号: 27, 期号: 2, 页码: 26104
Authors:  Tang QH(汤奇恒);  Yang TY(杨天勇);  Ding L;  Tang QH
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Nanoadhesion of a Power-Law Graded Elastic Material 期刊论文
Chinese Physics Letters, 2010, 卷号: 27, 期号: 10, 页码: 108102
Authors:  Chen SH(陈少华);  Chen PJ(陈培见);  Chen SH
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Biomimetic Fibrillar Interfaces  Adhesion  Contact  Design  Strip  
Curie Transition Of Nc Nickel By Mechanical Spectroscopy And Magnetization Study 期刊论文
Chinese Physics Letters, 2009, 卷号: 26, 期号: 3, 页码: 036102
Authors:  Li PY(李平云);  Cao ZH;  Zhang XY(张喜燕);  Wu XL(武晓雷);  Huang YN;  Meng XK;  Li PY
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Internal-friction  Nanocrystalline Nickel  Temperature  Relaxation  Aluminum  Behavior  Modulus  
Inherent Shear-Dilatation Coexistence In Metallic Glass 期刊论文
Chinese Physics Letters, 2009, 卷号: 26, 期号: 1, 页码: 016103 
Authors:  Jiang MQ(蒋敏强);  Jiang SY(江思跃);  Dai LH(戴兰宏);  Dai LH
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Localization  Behavior  Fracture  Model  Flow  
A Modified Free Volume Model For Characterizing Of Rate Effect In Bulk Metallic Glasses 期刊论文
Chinese Physics Letters, 2008, 页码: 1052-1055
Authors:  Liu LF(刘龙飞);  Dai LH(戴兰宏);  Bai YL(白以龙);  Liu, LF (reprint author), Hunan Univ Sci & Technol, Hunan Prov Key Lab Hlth Maintenance Mech Equipmen, Xiangtan 411201, Peoples R China.
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Compressive Behavior  Deformation  Flow  Transition  Alloys  
Molecular Dynamics Study Of Mechanical Behaviour Of Screw Dislocation During Cutting With Diamond Tip On Silicon 期刊论文
Chinese Physics Letters, 2008, 页码: 2946-2949
Authors:  Tang QH(汤奇恒);  Tang, QH (reprint author), Chinese Acad Sci, Inst Mech, State Key Lab Nonlinear Mech, Beijing 100080, Peoples R China.
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Phase-transformations  Simulation  Monocrystals  
(Ti,Al)N Film On Normalized T8 Carbon Tool Steel Prepared By Pulsed High Energy Density Plasma Technique 期刊论文
Chinese Physics Letters, 2007, 页码: 3469-3472
Authors:  Liu YF;  Deng FP;  Han JM;  Xu XY;  Yang SZ;  Liu XB(刘秀波);  Liu, YF (reprint author), Beijing Jiatong Univ, Inst Mat Sci & Engn, Beijing 100044, Peoples R China.
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Chemical-vapor-deposition  Ticl4/alcl3/n-2/h-2/ar Gas-mixture  (Ti1-xalx)n Coatings  Nitride Films  Behavior