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Effect of bias voltage on the growth of super-hard (AlCrTiVZr)N high-entropy alloy nitride films synthesized by high power impulse magnetron sputtering 期刊论文
APPLIED SURFACE SCIENCE, 2021, 卷号: 564, 页码: 10
Authors:  Xu Y(许亿);  Li GD(李国栋);  Li G(李光);  Gao FY(高方圆);  Xia Y(夏原)
Adobe PDF(2620Kb)  |  Favorite  |  View/Download：1256/154  |  Submit date：2021/08/16
High-entropy alloy nitride films  HiPIMS  Bias voltage  Plasma discharge characteristics  Microstructure  Hardness  
The plasma electrolytic oxidation micro-discharge channel model and its microstructure characteristic based on Ti tracer 期刊论文
APPLIED SURFACE SCIENCE, 2018, 卷号: 431, 页码: 13-16
Authors:  Gao FY(高方圆);  Hao L(郝丽);  Li G(李光);  Xia Y(夏原)
View  |  Adobe PDF(1050Kb)  |  Favorite  |  View/Download：360/88  |  Submit date：2018/02/08
Plasma Electrolytic Oxidation  Discharge Channel  Schematic Model  Ti Tracer  
Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films 期刊论文
APPLIED SURFACE SCIENCE, 2018, 卷号: 431, 页码: 160-164
Authors:  Gao FY(高方圆);  Li G(李光);  Xia Y(夏原)
View  |  Adobe PDF(1195Kb)  |  Favorite  |  View/Download：331/96  |  Submit date：2018/02/08
Tialsin Films  Reactive Sputtering  Hysteresis Effect  Plasma Characteristics  Mechanical Properties