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The plasma electrolytic oxidation micro-discharge channel model and its microstructure characteristic based on Ti tracer 期刊论文
APPLIED SURFACE SCIENCE, 2018, 卷号: 431, 页码: 13-16
Authors:  Gao FY(高方圆);  Hao L(郝丽);  Li G(李光);  Xia Y(夏原)
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Plasma Electrolytic Oxidation  Discharge Channel  Schematic Model  Ti Tracer  
Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films 期刊论文
APPLIED SURFACE SCIENCE, 2018, 卷号: 431, 页码: 160-164
Authors:  Gao FY(高方圆);  Li G(李光);  Xia Y(夏原)
View  |  Adobe PDF(1195Kb)  |  Favorite  |  View/Download:323/93  |  Submit date:2018/02/08
Tialsin Films  Reactive Sputtering  Hysteresis Effect  Plasma Characteristics  Mechanical Properties  
The plasma electrolytic oxidation micro-discharge channel model and its microstructure characteristic based on Ti tracer 会议论文
5th Asian International Conference on Heat Treatment and Surface Engineering, Hangzhou, PEOPLES R CHINA, NOV 12-14, 2016
Authors:  Gao FY(高方圆);  Hao L(郝丽);  Li G(李光);  Xia Y(夏原);  Li, G (reprint author), Chinese Acad Sci, Inst Mech, 15 Beisihuanxi Rd, Beijing 100190, Peoples R China.
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Alloy  Peo  Aluminum  Plasma Electrolytic Oxidation  Discharge Channel  Schematic Model  Ti Tracer  
Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films 会议论文
5th Asian International Conference on Heat Treatment and Surface Engineering, Hangzhou, PEOPLES R CHINA, NOV 12-14, 2016
Authors:  Gao FY(高方圆);  Li G(李光);  Xia Y(夏原);  Xia, Y (reprint author), Chinese Acad Sci, Inst Mech, 15 Beisihuanxi Rd, Beijing 100190, Peoples R China.
View  |  Adobe PDF(1195Kb)  |  Favorite  |  View/Download:347/88  |  Submit date:2018/01/16
Thin-films  Mechanical-properties  Coatings  Microstructure  Oxidation  Evolution  Al  Si  
Plasma characteristics and dynamics in a high power pulsed magnetron sputtering discharge 期刊论文
中国科学院大学学报, 2015, 卷号: 32, 期号: 2, 页码: 145-154
Authors:  Xia Y(夏原);  Gao FY(高方圆);  Li G(李光)
View  |  Adobe PDF(1949Kb)  |  Favorite  |  View/Download:320/84  |  Submit date:2015/12/25
Hipims  Hppms  等离子体动力学  放电特性  高离化率