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Effect of bias voltage on the growth of super-hard (AlCrTiVZr)N high-entropy alloy nitride films synthesized by high power impulse magnetron sputtering 期刊论文
APPLIED SURFACE SCIENCE, 2021, 卷号: 564, 页码: 10
Authors:  Xu Y(许亿);  Li GD(李国栋);  Li G(李光);  Gao FY(高方圆);  Xia Y(夏原)
Adobe PDF(2620Kb)  |  Favorite  |  View/Download：1240/149  |  Submit date：2021/08/16
High-entropy alloy nitride films  HiPIMS  Bias voltage  Plasma discharge characteristics  Microstructure  Hardness  
Effect of Cr Atom Plasma Emission Intensity on the Characteristics of Cr-DLC Films Deposited by Pulsed-DC Magnetron Sputtering 期刊论文
coatings, 2020, 卷号: 10, 期号: 7, 页码: 68
Authors:  Li G(李光);  Xu Y(许亿);  Xia Y(夏原)
View  |  Adobe PDF(1017Kb)  |  Favorite  |  View/Download：339/78  |  Submit date：2020/06/29
diamond-like carbon (DLC)  plasma emission intensity  magnetron sputtering  tribological performance